Three-dimensional semiconductor memory device and method for fabricating the same

ABSTRACT

A three-dimensional (3D) semiconductor memory device and a method for fabricating the same, the device including insulating layers stacked on a substrate; horizontal structures between the insulating layers, the horizontal structures including gate electrodes, respectively; vertical structures penetrating the insulating layers and the horizontal structures, the vertical structures including semiconductor pillars, respectively; and epitaxial patterns, each of the epitaxial patterns being between the substrate and each of the vertical structures, wherein a minimum width of the epitaxial pattern is less than a width of a corresponding one of the vertical structures.

CROSS-REFERENCE TO RELATED APPLICATIONS

This is a continuation application based on pending application Ser. No.14/790,969, filed Jul. 2, 2015, which in turn is a continuation ofapplication Ser. No. 13/974,122, filed Aug. 23, 2013, now U.S. Pat. No.9,076,879 B2 issued Jul. 7, 2015, the entire contents of which is herebyincorporated by reference.

Korean Patent Application No. 10-2012-0100516, filed on Sep. 11, 2012,in the Korean Intellectual Property Office, and entitled:“Three-Dimensional Semiconductor Memory Device and Method ForFabricating the Same,” Korean Patent Application No. 10-2013-0013509,filed on Feb. 6, 2013, in the Korean Intellectual Property Office, andentitled: “Three-Dimensional Semiconductor Memory Device and Method ForFabricating the Same,” and Korean Patent Application No.10-2013-0013510, filed on Feb. 6, 2013, in the Korean IntellectualProperty Office, and entitled: “Three-Dimensional Semiconductor MemoryDevice and Method For Fabricating the Same,” are incorporated byreference herein in their entirety.

BACKGROUND

1. Field

Embodiments relate to three-dimensional semiconductor memory devicesincluding vertically stacked memory cells and methods for fabricatingthe same.

2. Description of the Related Art

Semiconductor devices may become more highly integrated to meet therequirements (e.g., high performance and low costs) of customers. Anintegration density of the semiconductor memory devices may directlyaffect the costs of the semiconductor memory devices. Thus, highlyintegrated semiconductor memory devices may be desirable. Theintegration density of conventional two-dimensional (2D) or planarsemiconductor memory devices may be mostly influenced by a planar areain which a unit memory cell occupies. Thus, the integration density maybe influenced by a level of fine pattern forming technology. However,pattern fineness may be limited due to high cost equipment and/ordifficulties in semiconductor fabrication processes.

SUMMARY

Embodiments are directed to three-dimensional semiconductor memorydevices including vertically stacked memory cells and methods forfabricating the same.

The embodiments may also be realized by providing a three-dimensional(3D) semiconductor memory device including insulating layers stacked ona substrate; horizontal structures between the insulating layers, thehorizontal structures including gate electrodes, respectively; verticalstructures penetrating the insulating layers and the horizontalstructures, the vertical structures including semiconductor pillars,respectively; and epitaxial patterns, each of the epitaxial patternsbeing between the substrate and each of the vertical structures, whereina minimum width of the epitaxial pattern is less than a width of acorresponding one of the vertical structures.

A lowermost one of the horizontal structures is in contact with theepitaxial patterns; each of the epitaxial patterns has a recessedsidewall; and the lowermost horizontal structure has a convex portionalong the recessed sidewall of each of the epitaxial patterns.

Each of the epitaxial patterns has a laterally recessed sidewall.

A lowermost one of the horizontal structures is thicker than others ofthe horizontal structures; and top surfaces of the epitaxial patternsare higher than a top surface of the lowermost horizontal structure.

Thicknesses of the horizontal structures are substantially equal to eachother; and the epitaxial patterns are in contact with at least twovertically adjacent horizontal structures that are closest to thesubstrate.

Each of the horizontal structures further includes first and secondblocking insulating layers between each of the gate electrode and thesemiconductor pillars; and the first and second blocking insulatinglayers each include at least one of a silicon oxide layer and analuminum oxide layer.

Each of the vertical structures further includes a protecting layer, acharge storage layer, and a tunnel insulating layer; and horizontalstructures adjacent to the vertical structures are in contact with eachcharge storage layers of the vertical structures.

The embodiments may be realized by providing a method for fabricating athree-dimensional (3D) semiconductor memory device, the method includingforming a mold stack structure including insulating layers andsacrificial layers alternately and repeatedly stacked on a substrate;forming through-holes penetrating the mold stack structure, thethrough-holes exposing the substrate; forming an epitaxial layer in eachof the through-holes; forming a vertical structure in each of thethrough-holes such that the vertical structure includes a semiconductorpillar; patterning the mold stack structure to form a trench; removingthe sacrificial layers exposed by the trench to form recess regions;etching the epitaxial layer exposed by at least a lowermost one of therecess regions to form an epitaxial pattern having a recessed sidewall;and forming horizontal structures in the recess regions, respectively,such that each of the horizontal structures includes a gate electrode,wherein at least one of the horizontal structures is in contact with theepitaxial pattern.

Forming the epitaxial layer includes performing a selective epitaxialgrowth process using the substrate exposed by the through-holes as aseed; and wherein a top surface of the epitaxial layer is higher than atop surface of a lowermost one of the horizontal structures.

Forming the vertical structure includes sequentially forming aprotecting layer, a charge storage layer, and a tunnel insulating layerin each of the through-holes; and forming the semiconductor pillar onthe tunnel insulating layer in each of the through-holes.

The method may further include selectively removing the protecting layerexposed by the recess regions to expose the charge storage layer afterforming the recess regions.

Selectively removing the protecting layer and etching the epitaxiallayer are performed by a same etching process at a same time.

One of the sacrificial layers that contacts the epitaxial layer isformed of a material having an etch selectivity with respect to othersof the sacrificial layers; and removing the sacrificial layers,selectively removing the protecting layer, and etching the epitaxiallayer are performed by a same etching process.

A distance between portions of the gate electrode respectively adjacentto both recessed sidewalls of the epitaxial pattern is less than a widthof the vertical structure.

Each vertical structure further includes a charge storage layer and atunnel insulating layer; and each of the horizontal structures furtherincludes a blocking insulating layer.

The embodiments may also be realized by providing a three-dimensional(3D) semiconductor memory device including a lower structure including alower gate pattern and a lower semiconductor pattern penetrating thelower gate pattern, the lower semiconductor pattern being connected to asubstrate; and an upper structure including upper gate patterns stackedon the lower structure, an upper semiconductor pattern penetrating theupper gate patterns, and a vertical insulator between the uppersemiconductor pattern and the upper gate patterns, the uppersemiconductor pattern being connected to the lower semiconductorpattern, wherein the lower semiconductor pattern has a recessed regionadjacent to the lower gate pattern; and the recessed region of the lowersemiconductor pattern is defined by incline-surfaces inclined withrespect to a top surface of the substrate.

A minimum width of the lower semiconductor pattern is less than a lowerwidth of the upper semiconductor pattern.

A maximum width of the lower semiconductor pattern is greater than amaximum width of the upper semiconductor pattern.

A vertical thickness of the lower gate pattern is less than a maximumwidth of the lower semiconductor pattern.

The lower structure includes a plurality of lower gate patterns stackedon the substrate and an insulating layer between the lower gatepatterns; a horizontal section of the lower semiconductor patternadjacent to the insulating layer has a substantially circular shape; anda horizontal section of the lower semiconductor pattern at the recessedregion has a substantially quadrilateral shape.

A minimum width of the lower semiconductor pattern is about equal to adifference between a maximum width of the lower semiconductor patternand a vertical thickness of the lower gate pattern.

The lower semiconductor pattern is formed of silicon; and theincline-surfaces are {111} crystal planes of the silicon.

A horizontal width of the lower gate pattern is greater than ahorizontal width of each of the upper gate patterns.

The 3D semiconductor memory device may further include a horizontalinsulator between the lower gate pattern and the lower semiconductorpattern and between the vertical insulator and each of the upper gatepatterns, wherein the horizontal insulator between the lower gatepattern and the lower semiconductor pattern extends onto a top surfaceand a bottom surface of the lower gate pattern; and the horizontalinsulator between the vertical insulator and each of the upper gatepatterns extends onto a top surface and a bottom surface of each of theupper gate patterns.

The embodiments may also be realized by providing a method forfabricating a three-dimensional (3D) semiconductor memory device, themethod including forming a multi-layered structure including sacrificiallayers and insulating layers alternately and repeatedly stacked on asubstrate; forming an opening penetrating the multi-layered structuresuch that the opening exposes the substrate; forming a lowersemiconductor layer filling a lower region of the opening; forming avertical insulator and an upper semiconductor pattern in the openinghaving the lower semiconductor layer; patterning the multi-layeredstructure to form trenches exposing the substrate such that the trenchesare spaced apart from the opening; removing the sacrificial layersexposed by the trenches to form gate regions; selectively etching thelower semiconductor layer exposed by at least a lowermost one of thegate regions to form a lower semiconductor pattern having a recessedregion defined by incline-surfaces inclined with respect to a topsurface of the substrate; and forming gate patterns in the gate regions,respectively.

Forming the lower semiconductor layer includes performing a selectiveepitaxial growth process using the substrate exposed by the opening as aseed.

Selectively etching the lower semiconductor layer includes performing agas phase etching process or a chemical dry etching process using areaction gas containing a halogen element.

A maximum width of the lower semiconductor pattern is greater than amaximum width of the upper semiconductor pattern.

A minimum width of the lower semiconductor pattern is less than a lowerwidth of the upper semiconductor pattern.

The embodiments may also be realized by providing a three-dimensional(3D) semiconductor memory device including a stack structure includinginsulating layers vertically stacked on a substrate, and a lower gatepattern between the insulating layers; and a lower semiconductor patternpenetrating the lower gate pattern and being connected to the substrate,the lower semiconductor pattern having a recessed region defined byincline-surfaces inclined with respect to a top surface of thesubstrate, and the recessed region being adjacent to the lower gatepattern, wherein a maximum width of the recessed region in a directionvertical to the top surface of the substrate is less than a verticaldistance between adjacent insulating layers.

The vertical distance between the adjacent insulating layers is lessthan a maximum width of the lower semiconductor pattern.

A horizontal section of the lower semiconductor pattern adjacent to eachof the insulating layers has a substantially circular shape; and ahorizontal section of the lower semiconductor pattern at the recessedregion has a substantially quadrilateral shape.

The lower semiconductor pattern is formed of silicon; and theincline-surfaces are {111} crystal planes of the silicon.

The 3D semiconductor memory device may further include a horizontalinsulator between the lower gate pattern and the lower semiconductorpattern, the horizontal insulator extending onto a top surface and abottom surface of the lower gate pattern.

The 3D semiconductor memory device may further include upper gatepatterns stacked on the lower gate pattern; an upper semiconductorpattern penetrating the upper gate patterns and being connected to thelower semiconductor pattern; and a vertical insulator between the uppersemiconductor pattern and the upper gate patterns.

A minimum width of the lower semiconductor pattern is less than a lowerwidth of the upper semiconductor pattern.

A maximum width of the lower semiconductor pattern is greater than amaximum width of the upper semiconductor pattern.

A horizontal width of the lower gate pattern is greater than ahorizontal width of each of the upper gate patterns.

The embodiments may also be realized by providing a method forfabricating a three-dimensional (3D) semiconductor memory device, themethod including forming a lower structure including a lowersemiconductor layer connected to a substrate and insulating layersstacked on the substrate such that the insulating layers define a lowergate region that expose a portion of a sidewall of the lowersemiconductor layer; selectively etching the lower semiconductor layerexposed by the lower gate region to form a lower semiconductor patternhaving a recessed region defined by incline-surfaces inclined withrespect to a top surface of the substrate; isotropically etching theinsulating layers exposed by the lower gate region to form an enlargedlower gate region exposing a portion of a sidewall of the lowersemiconductor pattern that is vertical to the top surface of thesubstrate; and forming a gate pattern in the enlarged lower gate region.

A vertical height of the enlarged lower gate region is less than amaximum width of the lower semiconductor pattern.

Selectively etching the lower semiconductor layer exposed by the lowergate region includes performing a gas phase etching process or achemical dry etching process using a reaction gas containing a halogenelement.

The method may further include forming an upper structure on the lowerstructure before the lower semiconductor pattern is formed, wherein theupper structure includes an upper semiconductor pattern verticallyconnected to the lower semiconductor pattern; a vertical insulatorsurrounding an outer sidewall of the upper semiconductor pattern; andupper insulating layers vertically stacked on the lower structure anddefining upper gate regions that expose portions of a sidewall of thevertical insulator.

A maximum width of the lower semiconductor pattern is greater than amaximum width of the upper semiconductor pattern.

A minimum width of the lower semiconductor pattern is less than a lowerwidth of the upper semiconductor pattern.

BRIEF DESCRIPTION OF THE DRAWINGS

Features will become apparent to those of skill in the art by describingin detail exemplary embodiments with reference to the attached drawingsin which:

FIG. 1 illustrates a schematic circuit diagram of a cell array of athree-dimensional (3D) semiconductor memory device according to anembodiment;

FIG. 2 illustrates a perspective view illustrating a 3D semiconductormemory device according to an embodiment;

FIGS. 3 to 14 illustrate cross-sectional views of stages in a method forfabricating a 3D semiconductor memory device according to an embodiment;

FIG. 15 illustrates a cross-sectional view of a 3D semiconductor memorydevice according to a comparative embodiment;

FIG. 16 illustrates a cross-sectional view of a modified example of amethod for fabricating a 3D semiconductor memory device according to anembodiment;

FIG. 17 illustrates a cross-sectional view of another modified exampleof a method for fabricating a 3D semiconductor memory device accordingto an embodiment;

FIG. 18 illustrates a cross-sectional view of a 3D semiconductor memorydevice according to an embodiment;

FIG. 19 illustrates an enlarged view of a portion ‘A’ of FIG. 18;

FIG. 20 illustrates a perspective view of a lower semiconductor patternof a 3D semiconductor memory device according to an embodiment;

FIG. 21 illustrates a perspective view of a modified example of a 3Dsemiconductor memory device according to an embodiment;

FIGS. 22 to 30 illustrate cross-sectional views of stages in a methodfor fabricating a 3D semiconductor memory device according to anembodiment;

FIGS. 31 to 35 illustrate partial cross-sectional views of stages in amethod for fabricating a 3D semiconductor memory device according to anembodiment;

FIGS. 36 to 38 illustrate partial cross-sectional views of stages in amethod for fabricating a 3D semiconductor memory device according to anembodiment;

FIGS. 39 to 42 illustrate partial cross-sectional views of 3Dsemiconductor memory devices according to an embodiment;

FIGS. 43 to 46 illustrate partial cross-sectional views of stages in amethod for fabricating a 3D semiconductor memory device according to anembodiment;

FIGS. 47 to 49 illustrate partial cross-sectional views of stages in amethod for fabricating a 3D semiconductor memory device according to anembodiment;

FIG. 50 illustrates a schematic block diagram of an example ofelectronic systems including 3D semiconductor memory devices accordingto an embodiment;

FIG. 51 illustrates a schematic block diagram of an example of memorycards including 3D semiconductor memory devices according to anembodiment; and

FIG. 52 illustrates a schematic block diagram of an example ofinformation processing systems including 3D semiconductor memory devicesaccording to an embodiment.

DETAILED DESCRIPTION

The embodiments will now be described more fully hereinafter withreference to the accompanying drawings, in which exemplary embodimentsare shown. The advantages and features of the embodiments and methods ofachieving them will be apparent from the following exemplary embodimentsthat will be described in more detail with reference to the accompanyingdrawings. It should be noted, however, that the embodiments are notlimited to the following exemplary embodiments, and may be implementedin various forms. Accordingly, the exemplary embodiments are providedonly to disclose the embodiments and let those skilled in the art knowthe category of the embodiments. In the drawings, embodiments are notlimited to the specific examples provided herein and may be exaggeratedfor clarity.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to limit the scope. As used herein,the singular terms “a,” “an” and “the” are intended to include theplural forms as well, unless the context clearly indicates otherwise. Asused herein, the term “and/or” includes any and all combinations of oneor more of the associated listed items. It will be understood that whenan element is referred to as being “connected” or “coupled” to anotherelement, it may be directly connected or coupled to the other element orintervening elements may be present.

Similarly, it will be understood that when an element such as a layer,region, or substrate is referred to as being “on” another element, itcan be directly on the other element or intervening elements may bepresent. In contrast, the term “directly” means that there are nointervening elements. It will be further understood that the terms“comprises”, “comprising,”, “includes” and/or “including”, when usedherein, specify the presence of stated features, integers, steps,operations, elements, and/or components, but do not preclude thepresence or addition of one or more other features, integers, steps,operations, elements, components, and/or groups thereof.

Additionally, the embodiment in the detailed description will bedescribed with sectional views as ideal exemplary views. Accordingly,shapes of the exemplary views may be modified according to manufacturingtechniques and/or allowable errors. Therefore, the embodiments are notlimited to the specific shape illustrated in the exemplary views, butmay include other shapes that may be created according to manufacturingprocesses. Areas exemplified in the drawings have general properties,and are used to illustrate specific shapes of elements. Thus, thisshould not be construed as limited to the scope of the embodiments.

It will be also understood that although the terms first, second, third,etc. may be used herein to describe various elements, these elementsshould not be limited by these terms. These terms are only used todistinguish one element from another element. Thus, a first element insome embodiments could be termed a second element in other embodimentswithout departing from the teachings of the embodiments. Exemplaryembodiments explained and illustrated herein may include theircomplementary counterparts. The same reference numerals or the samereference designators denote the same elements throughout thespecification.

Moreover, exemplary embodiments are described herein with reference tocross-sectional illustrations and/or plane illustrations that areidealized exemplary illustrations. Accordingly, variations from theshapes of the illustrations as a result, for example, of manufacturingtechniques and/or tolerances, are to be expected. Thus, exemplaryembodiments should not be construed as limited to the shapes of regionsillustrated herein but are to include deviations in shapes that result,for example, from manufacturing. For example, an etching regionillustrated as a rectangle may, typically, have rounded or curvedfeatures. Thus, the regions illustrated in the figures are schematic innature and their shapes are not intended to illustrate the actual shapeof a region of a device and are not intended to limit the scope ofexample embodiments.

A three-dimensional (3D) semiconductor memory device according to anembodiment may include, e.g., a cell array region, a peripheral circuitregion, and a connection region. Memory cells, bit lines, and word linesmay be disposed in the cell array region. The bit lines and the wordlines may be provided for electrical connection of the memory cells.Peripheral circuits for driving the memory cells and for sensing data inthe memory cells may be provided in the peripheral circuit region. Forexample, a word line driver, a sense amplifier, a row decoder, a columndecoder, and control circuits may be disposed in the peripheral circuitregion. The connection region may be disposed between the cell arrayregion and the peripheral circuit region. An interconnection structureelectrically connecting the bit and word lines to the peripheralcircuits may be disposed in the connection region.

FIG. 1 illustrates a schematic circuit diagram of a cell array of athree-dimensional (3D) semiconductor memory device according to anembodiment.

Referring to FIG. 1, a cell array of a 3D semiconductor memory deviceaccording to an embodiment may include a common source line CSL, a bitline BL, and a plurality of cell strings CSTR between the common sourceline CSL and the bit line BL.

The bit lines BL may be two-dimensionally arranged. A plurality of thecell strings CSTR may be connected in parallel to each of the bit linesBL. The cell strings CSTR may be connected in common to the commonsource line CSL. For example, a plurality of cell strings CSTR may bebetween the common source line CSL and the bit lines BL. In anembodiment, a plurality of the common source lines CSL may betwo-dimensionally arranged. A constant voltage may be applied to theplurality of common source lines CSL. Alternatively, the plurality ofcommon source lines CSL may be electrically controlled independently ofeach other.

Each of the cell strings CSTR may include a ground selection transistorGST connected to the common source line CSL, a string selectiontransistor SST connected to the bit line BL, and a plurality of memorycell transistors MCT between the ground and string selection transistorsGST and SST. The ground selection transistor GST, the plurality ofmemory cell transistors MCT, and the string selection transistor SST maybe connected in series to each other in each of the cell strings CSTR.

The common source line CSL may be connected in common to sources of theground selection transistors GST. A ground selection line GSL, aplurality of word lines WL0 to WL3, and a string selection line SSL(which are disposed between the common source line CSL and the bit lineBL) may be used as gate electrodes of the ground selection transistorGST, the memory cell transistors MCT, and the string selectiontransistor SST, respectively. Each of the memory cell transistors MCTmay include a memory element.

FIG. 2 illustrates a perspective view of a 3D semiconductor memorydevice according to an embodiment.

Referring to FIG. 2, an electrode structure 115 may be disposed on asubstrate 100. The electrode structure 115 may include insulating layers111 a and 111 and horizontal structures 150 a and 150 that arealternately and repeatedly stacked on the substrate 100. The insulatinglayers 111 a and 111 and the horizontal structures 150 a and 150 mayextend in a first direction. The insulating layers 111 a and 111 may be,e.g., silicon oxide layers. A lowermost one 111 a of the insulatinglayers 111 a and 111 may be thinner than others 111 of the insulatinglayers 111 a and 111. Each of the horizontal structures 150 a and 150may include first and second blocking insulating layers 142 and 143 anda gate electrode 145. The electrode structure 115 may include aplurality of electrode structures 115 that face each other in a seconddirection crossing the first direction. The first and second directionsmay correspond to an x-axis direction and a y-axis direction of FIG. 2,respectively. A trench 140 may be defined between the adjacent electrodestructures 115. The trench 140 may extend in the first direction. Acommon source line CSL may be disposed in the substrate 100 exposed bythe trench 140. The common source lines CSL may be a dopant region thatis heavily doped with dopants. Even though not illustrated in FIG. 2, anisolation insulating layer may fill the trench 140.

Vertical structures 130 may penetrate the electrode structures 115. Inan embodiment, the vertical structures 130 may be arranged in matrixform along the first and second directions in a plan view. For example,the vertical structures 130 penetrating each of the electrode structures115 may be arranged in a line along the first direction when viewed froma plan view. In another embodiment, the vertical structures penetratingeach of the electrode structures 115 may be arranged in a zigzag formalong the first direction when viewed from a plan view. Each of thevertical structures 130 may include a protecting layer 124, a chargestorage layer 125, a tunnel insulating layer 126, and a semiconductorpillar 127. In an embodiment, the semiconductor pillar 127 may have ahollow tube-shape. In this case, a filling layer 128 may fill a hollowregion of the semiconductor pillar 127. A drain region D may be disposedin an upper portion of the semiconductor pillar 127, and a conductivepattern 129 may be disposed on the drain region D. The conductivepattern 129 may be connected to a bit line BL. The bit line BL mayextend in a direction crossing the horizontal structures 150 a and 150,e.g., in the second direction. In an embodiment, the vertical structures130 arranged in the second direction may be connected to one bit lineBL.

The first and second blocking insulating layers 142 and 143 (in each ofthe horizontal structures 150 a and 150) and the charge storage layer125 and the tunnel insulating layer 126 (in each of the verticalstructures 130) may be defined as a data storage element. For example, aportion of the data storage element may be included in the verticalstructure 130, and a remaining portion of the data storage element maybe included in the horizontal structure 150 a or 150. According to anembodiment, the charge storage layer 125 and the tunnel insulating layer126 of the data storage element may be included in the verticalstructure 130, and the first and second blocking insulating layers 142and 143 of the data storage element may be included in the horizontalstructure 150 a or 150.

An epitaxial pattern 122 may be disposed between the substrate 100 andeach of the vertical structures 130. The epitaxial patterns 122 mayconnect the vertical structures 130 to the substrate 100. The epitaxialpatterns 122 may be in contact with at least one floor or level of thehorizontal structures. In other words, as will be apparent to a personof ordinary skill in the art from the foregoing description and from thedrawings, as illustrated in FIG. 2, the epitaxial patterns 122 may be incontact with at least one of the horizontal structures 150 and 150 a,e.g., a lowermost horizontal structure 150 a. In another embodiment, theepitaxial patterns 122 may be in contact with a plurality of, e.g., twofloors or levels of horizontal structures. In other words, as will beapparent to a person of ordinary skill in the art from the foregoingdescription and from the drawings, the epitaxial patterns 122 may be incontact with at least two of the horizontal structures 150 and 150 a.This will be described with reference to FIG. 16 in more detail below.Meanwhile, if the epitaxial pattern 122 is in contact with the lowermosthorizontal structure 150 a, as illustrated in FIG. 2, the lowermoststructure 150 a may be thicker than the other horizontal structures 150.The lowermost horizontal structure 150 a (contacting the epitaxialpattern 122) may correspond to the ground selection line GSL of the cellarray in the 3D semiconductor memory device described with reference toFIG. 1. The horizontal structures 150 (contacting the vertical structure130) may include the plurality of word lines WL0 to WL3 in FIG. 1.

Each of the epitaxial patterns 122 may have a recessed sidewall 122 a.Thus, the lowermost horizontal structure 150 a (contacting the epitaxialpattern 122) may be disposed along a profile of the recessed sidewall122 a of the epitaxial pattern 122. For example, the lowermosthorizontal structure 150 a may have a convex portion toward the recessedsidewall 122 a of the epitaxial pattern 122. For example, the convexportion of the lowermost horizontal structure 150 a may fill a recessedregion defined by the recessed sidewall 122 a of the epitaxial pattern122. A minimum width W2 of the epitaxial pattern 122 may be less than awidth W1 of the vertical structure 130. According to an embodiment, theepitaxial pattern 122 may have the laterally recessed sidewall 122 a.Thus, a process margin may be secured in a process of forming thelowermost horizontal structure 150 a that contacts the epitaxial pattern122. As a result, the 3D semiconductor memory device with improvedreliability may be realized.

Hereinafter, the 3D semiconductor memory devices and method forfabricating the same according to an embodiment will be described inmore detail with reference to the drawings.

FIGS. 3 to 14 illustrate cross-sectional views of stages in a method forfabricating a 3D semiconductor memory device according to an embodiment.

Referring to FIG. 3, a mold stack structure 110 may be formed on asubstrate 100. The substrate 100 may include at least one of materialshaving semiconductor properties, insulating materials, and asemiconductor or conductor covered by an insulating material. Forexample, the substrate 100 may be a silicon wafer. In an embodiment,dopants of a first conductivity type may be injected into the substrate100 to form a well region (not shown).

The mold stack structure 110 may include a plurality of insulatinglayers 111 a and 111 and a plurality of sacrificial layers 112 a and112. The insulating layers 111 a and 111 and the sacrificial layers 112a and 112 may be alternately and repeatedly stacked on the substrate100. The sacrificial layers 112 a and 112 may be formed of a materialhaving an etch selectivity with respect to the insulating layers 111 aand 111. For example, when the sacrificial layers 112 a and 112 areetched using a predetermined etch recipe, an each rate of thesacrificial layers 112 a and 112 may be far greater than that of theinsulating layers 111 a and 111. Thus, etching of the insulating layers111 a and 111 may be minimized during the etching process of thesacrificial layers 112 a and 112. Each of the insulating layers 111 aand 111 may include at least one of a silicon oxide layer and a siliconnitride layer. Each of the sacrificial layers 112 a and 112 may includeat least one of a silicon layer, a silicon oxide layer, a siliconcarbide layer, and a silicon nitride layer, and is different from theinsulating layers 111 a and 111. Hereinafter, the insulating layers 111a and 111 of silicon oxide layers and the sacrificial layers 112 a and111 of silicon nitride layers will be described as an example for thepurpose of ease and convenience in explanation.

In an embodiment, at least one of the sacrificial layers 112 a and 112may have a thickness different from others of the sacrificial layers 112a and 112. For example, a lowermost one 112 a of the sacrificial layers112 a and 112 may be thicker than the others 112 of the sacrificiallayers 112 a and 112. The lowermost sacrificial layer 112 a may define aregion in which the ground selection line GSL in FIG. 1 will be formed.At least one of the insulating layers 111 a and 111 may have a thicknessdifferent from others of the insulating layers 111 a and 111. Forexample, a lowermost one 111 a of the insulating layers 111 a and 111may be thinner than the other insulating layers 111. However, theembodiments are not limited thereto. The thicknesses of the insulatinglayers 111 a and 111 and the sacrificial layers 112 a and 112 may bevariously modified. Additionally, a number of the layers constitutingthe mold stack structure 110 may be variously modified. The insulatinglayers 111 a and 111 and the sacrificial layers 112 a and 112 may beformed by, e.g., a chemical vapor deposition (CVD) method. In anotherembodiment, the lowermost insulating layer 111 a may be formed by athermal oxidation process.

Referring to FIG. 4, through-holes 120 may be formed to penetrate themold stack structure 110. The through-holes 120 may expose the substrate100. For example, the insulating layers 111 a and 111 and thesacrificial layers 112 a and 112 may be anisotropically etched until atop surface of the substrate 100 is exposed, thereby forming thethrough-holes 120. Subsequently, the epitaxial patterns 122 and thevertical structures 130 of FIG. 2 may be formed in the through-holes120. The through holes 120 may be arranged in matrix form along a firstdirection and a second direction in a plan view, like the verticalstructures 130 of FIG. 2. Alternatively, the through-holes 120 may bearranged in a zigzag form along the first direction in a plan view. Thefirst and second directions may correspond to the x-axis direction andthe y axis direction of FIG. 2, respectively.

Referring to FIG. 5, an epitaxial layer 121 may be formed to partiallyfill each of the through-holes 120. The epitaxial layer 121 may beformed by a selective epitaxial growth (SEG) process using the substrate100 (exposed by the through-hole 121) as a seed. Thus, if the substrate100 is formed of single-crystalline silicon, the epitaxial layer 121 mayalso be formed of single-crystalline silicon. The epitaxial layer 121may be formed to cover a sidewall of the lowermost sacrificial layer 112a, which is exposed by the through-hole 120. For example, a top surfaceof the epitaxial layer 121 may be disposed at a level substantiallyequal to or higher than a level of a top surface of the lowermostsacrificial layer 112 a. In an embodiment, the top surface of theepitaxial layer 121 may be higher than the top surface of the lowermostsacrificial layer 112 a and lower than a top surface of the insulatinglayer 111 disposed directly on the lowermost sacrificial layer 112 a,e.g., relative to a surface of the substrate 100.

Referring to FIG. 6, a protecting layer 124 may be formed on theepitaxial layer 121. The protecting layer 124 may include, e.g., asilicon oxide layer. The protecting layer 124 may be conformally formedin the through-hole 120 having the epitaxial layer 121 therein. Theprotecting layer 124 may protect a charge storage layer 125 formed in asubsequent process. For example, the protecting layer 124 may be formedby an atomic layer deposition (ALD) process. The charge storage layer125 may be formed on the protecting layer 124. The charge storage layer125 may include a charge trapping layer and/or an insulating layerincluding conductive nanoparticles. The charge trapping layer mayinclude, e.g., a silicon nitride layer. Next, a tunnel insulating layer126 may be formed on the charge storage layer 125. The tunnel insulatinglayer 126 may be a single-layer or a multi-layer including a pluralityof thin layers. The tunnel insulating layer 126 may include, e.g., asilicon oxide layer. The charge storage layer 125 and the tunnelinsulating layer 126 may be formed by, e.g., an ALD method.

According to an embodiment, the charge storage layer 125 and the tunnelinsulating layer 126 may be formed in the through-hole 120. Thus, avertical scale of the 3D semiconductor memory device may be reduced.

Referring to FIG. 7, a semiconductor pillar 127 may be formed on thetunnel insulating layer 126 in each through-hole 120. The semiconductorpillar 127 may be single-layered or multi-layered. In an implementation,forming the semiconductor pillar 127 may include forming a firstsemiconductor layer on the tunnel insulating layer 126; andanisotropically etching the first semiconductor layer to expose theepitaxial layer 121. At this time, portions of the first semiconductorlayer may remain on a sidewall of the tunnel insulating layer 126disposed on the sidewall of the through-hole 120. Subsequently, a secondsemiconductor layer may be formed on the first semiconductor layer inthe through-hole 120. Thus, the semiconductor pillar 127 may be formedin the through-hole 120. The second semiconductor layer may be incontact with the first semiconductor layer and the exposed portion ofthe epitaxial layer 121. The top surface of the epitaxial layer 121 mayhave a first portion contacting the semiconductor pillar 127 and asecond portion not contacting the semiconductor pillar 127. In anembodiment, the first portion of the top surface of the epitaxial layer121 may be substantially coplanar with the second portion of the topsurface of the epitaxial layer 121. In another embodiment, asillustrated in FIG. 7, the first portion of the top surface of theepitaxial layer 121 may be lower than the second portion of the topsurface of the epitaxial layer 121, e.g., relative to a surface of thesubstrate 100. For example, a bottom surface of the semiconductor pillar127 may be lower than the second portion of the top surface of theepitaxial layer 121. The layers constituting the semiconductor pillar127 may be formed by an ALD process. In an embodiment, the semiconductorpillar 127 may include amorphous silicon. In this case, a thermaltreatment process may be performed to convert the amorphous silicon ofthe semiconductor pillar 127 into polycrystalline silicon orsingle-crystalline silicon. In an embodiment, the second semiconductorlayer for the semiconductor pillar 127 may partially fill thethrough-hole 120, and then a filling layer 128 may be formed on thesecond semiconductor layer to fill the through-hole 120. Subsequently,the filling layer 128 and the second semiconductor layer may beplanarized until the uppermost insulating layer 111 is exposed. Inanother embodiment, the semiconductor pillar 127 may fully fill thethrough-hole 120. In this case, the filling layer 128 may be omitted.

As a result, a vertical structure 130 may be formed in each of thethrough-holes 120. The vertical structure 130 may include the protectinglayer 124, the charge storage layer 125, the tunnel insulating layer126, and the semiconductor pillar 127, and the filling layer 128, whichare sequentially formed in the through-hole 120. The vertical structure130 may be connected to the substrate 100 through the epitaxial layer121.

Referring to FIG. 8, top surfaces of the semiconductor pillar 127 andthe filling layer 128 may be recessed to be lower than a top surface ofthe uppermost insulating layer 111. A conductive pattern 129 may beformed on the recessed top surfaces of the semiconductor pillar 127 andthe filling layer 128 in each of the through-holes 120. The conductivepattern 129 may include a doped polysilicon and/or a metal. Dopant ionsmay be implanted into the conductive pattern 129 and/or an upper portionof the semiconductor pillar 127 to form a drain region D. The drainregion D may be doped with N-type dopants.

A trench 140 may be formed to divide the mold stack structure 110 into aplurality of mold stack patterns. The trench 140 may be formed betweenthe vertical structures 130. The insulating layers 111 a and 111 and thesacrificial layers 112 a and 112 may be successively patterned to formthe trench 140 that exposes the substrate 100. The trench 140 may extendin the first direction (i.e., the x-axis direction of FIG. 2) to dividethe mold stack structure 110 into the plurality of mold stack patterns.The mold stack patterns 110 may be spaced apart from each other in thesecond direction (i.e., the y-axis direction of FIG. 2).

Referring to FIG. 9, the sacrificial layers 112 a and 112 of FIG. 8(exposed by the trench 140) may be removed, e.g., selectively orcompletely removed, to form recess regions 141 a and 141. The recessregions 141 a and 141 may correspond to regions from which thesacrificial layers 112 a and 112 are removed. The recess regions 141 aand 141 may be defined by the vertical structures 130 and the insulatinglayers 111 a and 111. A lowermost one 141 a of the recess regions 141 aand 141 may be formed by removing the lowermost sacrificial layer 112 a.The lowermost recess region 141 a may expose the epitaxial layer 121. Inan embodiment, if the sacrificial layers 112 a and 112 are formed ofsilicon nitride layers or silicon oxynitride layers, the sacrificiallayers 112 a and 112 may be removed using an etching solution includingphosphoric acid. Other ones of the recess regions 141 may expose theprotecting layer 124. For example, the protecting layer 124 may protectthe charge storage layer 125 from the etching solution used for theremoval of the sacrificial layers 112 a and 112.

Next, the protecting layer 124, e.g., portions of the protecting layer124 exposed by the recess regions 141, may be selectively removed toexpose portions of the charge storage layer 125. The protecting layer124 may be selectively etched using an etch-recipe or etchant having anetch selectivity with respect to the charge storage layer 125. In anembodiment, the epitaxial layer 121 exposed by the lowermost recessregion 141 a may not be etched during the selective removal of theprotecting layer 124. For example, if the protecting layer 124 is formedof a silicon oxide layer and the epitaxial layer 121 is formed ofsilicon, the protecting layer 124 may be removed using an etch-recipe oretchant that selectively etches the silicon oxide layer. For example,the protecting layer 124 may be removed by an etching solution includinghydrofluoric acid.

Referring to FIG. 10, the exposed epitaxial layer 121 of FIG. 9 may beselectively etched to form an epitaxial pattern 122 having a recessedsidewall 122 a. A sidewall of the epitaxial layer 121 (which is exposedby the lowermost recess region 141 a) may be partially etched to formthe epitaxial pattern 122. The epitaxial layer 121 may be etched by anetching process having an etch selectivity with respect to the chargestorage layer 125, such that the exposed charge storage layer 125 maynot be etched during the formation of the epitaxial pattern 122. Theetching process performed on the epitaxial layer 121 may include a wetetching process or a dry etching process. In an embodiment, if theepitaxial layer 121 is isotropically etched using the wet etchingprocess, the recessed sidewall 122 a of the epitaxial pattern 122 mayhave a rounded shape. Thus, the minimum width W2 of the epitaxialpattern 122 may be less than a width W1 of the vertical structure 130 orthrough-hole 120.

In another embodiment, removing the protecting layer 124 of FIG. 9 andforming the epitaxial pattern 122 may be performed by a single etchingprocess at a same time. For example, if the protecting layer 124 is asilicon oxide layer and the epitaxial layer 121 is formed of silicon,the single etching process may be performed using an etch-recipe oretchant that simultaneously etches the silicon oxide layer and thesilicon. Thus, the epitaxial pattern 122 having the recessed sidewall122 a may be formed during or at the same time as the selective removalof the protecting layer 124. In this case, the etch-recipe or etchant ofthe single etching process may have an etch selectivity with respect tothe charge storage layer 125, such that the charge storage layer 125 maynot be etched. For example, the epitaxial layer 121 may be etched by awet etching process using O₃HF, a standard cleaning 1 (SC1) solution, orammonia or by a dry etching process using a gas.

In still another embodiment, forming the recess regions 141 a and 141and forming the epitaxial pattern 122 may be performed by a same etchingprocess at a same time. In this case, the lowermost sacrificial layer112 a may be formed of a material having an etch selectivity withrespect to the other sacrificial layers 112. In other words, thesacrificial layer 112 a contacting the epitaxial layer 121 may be formedof a material having an etch rate different from those of the othersacrificial layers 112 contacting the vertical structure 130. Forexample, the sacrificial layers 112 a and 112 may include siliconnitride, and a nitrogen concentration of the lowermost sacrificial layer112 a may be higher than those of the other sacrificial layers 112. Forexample, the lowermost sacrificial layer 112 a may include nitrogen-richsilicon nitride, and the other sacrificial layers 112 may includesilicon nitride. Thus, when the recess regions 141 a and 141 formed byremoving the sacrificial layers 112 a and 112, the etch rate of thelowermost sacrificial layer 112 a may be greater than those of the othersacrificial layers 112, such that the sidewall of the epitaxial layer121 may also be etched to form the epitaxial pattern 122. The etchingprocess for the removal of the sacrificial layers 112 a and 112 may usean etching solution including phosphoric acid. In this case, theprotecting layer 124 exposed by the recess regions 141 may be alsoetched. As a result, forming the recess regions 141 a and 141,selectively removing the protecting layer 124, and forming the epitaxialpattern 122 may be performed by the same etching process at the sametime.

Referring to FIG. 11, a first blocking insulating layer 142 and a secondblocking insulating layer 143 may be sequentially formed on innersurfaces of the recess regions 141 a and 141. The first and secondblocking insulating layers 142 and 143 may be conformally depositedalong exposed inner surfaces of the recess regions 141 a and 141 and thetrench 140. For example, the first blocking insulating layer 142 mayinclude a silicon oxide layer, and the second blocking insulating layer143 may include an aluminum oxide layer. However, the embodiments arenot limited thereto. A stacking order of the first and second blockinginsulating layers 142 and 143 may be variously modified. Each of thefirst and second blocking insulating layers 142 and 143 may be formed byan ALD method. In an implementation, the first and second blockinginsulating layers 142 and 143 in the lowermost recess region 141 a maybe conformally deposited on the recessed sidewall 122 a of the epitaxialpattern 122. As a result, the first and second blocking insulatinglayers 142 and 143 contacting the epitaxial pattern 122 may have aconvex shape toward the epitaxial pattern 122.

Referring to FIG. 12, an electrode layer 144 may be formed on the secondblocking insulating layer 143. The electrode layer 144 may be formed inthe recess regions 141 a and 141 of FIG. 11 and the trench 140 of FIG.11. The electrode layer 144 may completely fill the recess regions 141 aand 141 and may partially fill the trench 140. The electrode layer 144may be conformally deposited on the inner surface of the trench 140. Theelectrode layer 144 may include at least one of a doped polycrystallinesilicon layer, a metal layer (e.g., a tungsten layer), and/or a metalnitride layer. In an embodiment, the electrode layer 144 may include abarrier metal layer and a bulk metal layer that are sequentiallystacked. The barrier metal layer may include a transition metal (e.g.,titanium or tantalum) and/or a metal nitride (e.g., titanium nitride,tantalum nitride, or tungsten nitride), and the bulk metal layer mayinclude tungsten.

Referring to FIG. 13, the electrode layer 144 of FIG. 12 (outside therecess regions 141 a and 141 of FIG. 11) may be removed. Thus, theelectrode layer 144 in the trench 140 may be removed. For example, theelectrode layer 144 outside of the recess regions 141 a and 141 may beremoved by an isotropic etching process. As a result, gate electrodes145 a and 145 may be confinedly formed in the recess regions 141 a and141, respectively. If the electrode layer 144 includes the barrier metallayer and the bulk metal layer, the bulk metal layer and the barriermetal layer in the trench 140 may be removed to form the gate electrodes145 a and 145. In this case, each of the gate electrodes 145 a and 145may include a barrier metal pattern and a bulk metal pattern confinedlydisposed in each of the recess regions 141 a and 141. The gateelectrodes 145 a and 145 are formed, such that horizontal structures 150a and 150 are formed in the recess regions 141 a and 141. Each of thehorizontal structures 150 a and 150 may include the first and secondblocking insulating layers 142 and 143 and each of the gate electrodes145 a and 145. The lowermost horizontal structure 150 a in the lowermostrecess region 141 a of FIG. 11 may be formed along the recessed sidewall122 a of the epitaxial pattern 122, so as to have a laterally convexshape.

Subsequently, a high dose of dopant ions may be implanted into thesubstrate 100 exposed by the trench 140 to form a dopant region in thesubstrate 100. The dopant region corresponds to a common source lineCSL.

Referring to FIG. 14, an isolation insulating layer 155 may be formed tofill the trench 140 of FIG. 13. The isolation insulating layer 155 mayextend in the first direction along the trench 140 in a plan view.Subsequently, as illustrated in FIG. 2, bit lines BL may be formed. Thevertical structures 130 arranged in the second direction may beconnected in common to one bit line BL.

The 3D semiconductor memory device according to the present embodimentmay include the epitaxial pattern 122 between the substrate 100 and eachof the vertical structures 130. The epitaxial pattern 122 may have therecessed sidewall 122 a. The minimum width W2 of the epitaxial pattern122 may be less than the width W1 of the vertical structure 130. Thus,the lowermost horizontal structure 150 a that contacts the epitaxialpattern 122 may have the convex shape that is complementary to therecessed sidewall 122 a of the epitaxial pattern 122. As a result, ahorizontal distance between a center of the epitaxial pattern 122 andthe lowermost gate electrode 145 a of the lowermost horizontal structure150 a may be substantially equal to or less than a horizontal distancebetween a center of the vertical structure 130 and each of the othergate electrodes 145. For example, a distance W3 between portions of thelowermost gate electrode 145 a that are respectively disposed at bothsides of the epitaxial pattern 122 may be substantially equal to or lessthan the width W1 of the vertical structure 130. The lowermost gateelectrode 145 a may have an electrode-hole through which the epitaxialpattern 122 passes. The first and second blocking insulating layers 142and 143 of the lowermost horizontal structure 150 a may be disposedbetween an inner sidewall of the electrode-hole of the lowermost gateelectrode 145 a and the recessed sidewall 122 a of the epitaxial pattern122. The distance W3 of the lowermost gate electrode 145 a maycorrespond to the minimum width of the electrode-hole defined in thelowermost gate electrode 145 a. This will be described as compared witha comparative embodiment.

FIG. 15 illustrates a cross-sectional view of a 3D semiconductor memorydevice according to a comparative embodiment.

Referring to FIG. 15, according to the comparative embodiment, adistance W4 between portions of a lowermost gate electrode 145 a thatare respectively disposed at both sides of an epitaxial pattern 122 gmay be greater than the width W1 of the vertical structure 130. Theepitaxial pattern 122 g may be formed of a different material from theprotecting layer 124. Thus, the epitaxial pattern 122 g may not beetched in the process in which the protecting layer 124 is selectivelyremoved to expose the charge storage layer 125. Therefore, the distanceW4 of the lowermost gate electrode 145 a may be greater than the widthW1 of the vertical structure 130. As a result, an occupied space of thelowermost gate electrode 145 a may be less than those of the other gateelectrodes 145, such that a process error may occur in a depositionprocess for the lowermost gate electrode 145 a. However, the epitaxialpattern 122 according to the embodiments may be formed to have therecessed sidewall 122 a as illustrated in FIG. 14. Thus, the 3Dsemiconductor memory device according to an embodiment may exhibitimproved reliability.

FIG. 16 illustrates a cross-sectional view illustrating a modifiedexample of a method for fabricating a 3D semiconductor memory deviceaccording to an embodiment. In the present modified example, the sameelements as described with reference to FIGS. 1 to 14 will be indicatedby the same reference numerals or the same reference designators, andthe descriptions to the same elements may be omitted or mentionedbriefly.

Referring to FIG. 16, the first and second blocking insulating layers142 and 143, the charge storage layer 125, and the tunnel insulatinglayer 126 may be defined as the data storage element of the 3Dsemiconductor memory device, as described with reference to FIG. 2. Aportion of the data storage element may be included in the verticalstructure 130, and remaining portions of the data storage element may beincluded in the horizontal structure 150. In the present modifiedexample, the tunnel insulating layer 126 may be included in the verticalstructure 130, and the charge storage layer 125 and the first and secondblocking insulating layers 142 and 143 may be included in the horizontalstructure 150.

To achieve this, the protecting layer 125 and the tunnel insulatinglayer 126 may be formed in the through-hole in the process of FIG. 6,and the charge storage layer 125 and the first and second blockinginsulating layers 142 and 143 may be sequentially formed in the recessregion in the process of FIG. 11. Other processes for fabricating the 3Dsemiconductor memory device according to the present modified examplemay be substantially the same as corresponding processes describedabove.

FIG. 17 illustrates a cross-sectional view of another modified exampleof a method for fabricating a 3D semiconductor memory device accordingto an embodiment. In the present modified example, the same elements asdescribed with reference to FIGS. 1 to 14 and 16 will be indicated bythe same reference numerals or the same reference designators, and thedescriptions to the same elements may be omitted or mentioned briefly.

Referring to FIG. 17, an epitaxial pattern 123 according to the presentmodified example may be in contact with two floors or levels ofhorizontal structures, e.g., the lowermost and a second-lowermost of thehorizontal structures 150 a. For example, the epitaxial pattern 123 maybe in contact with two adjacent ones of the horizontal structures thatare closest to the substrate 100. Unlike the 3D semiconductor memorydevice illustrated in FIGS. 2 and 14, thicknesses of the horizontalstructures 150 and 150 a may be substantially equal to each other in thepresent modified example. As described in the embodiments of FIGS. 2, 14and 16, the epitaxial pattern 123 may have a recessed sidewall 123 a.Thus, a distance W5 between portions of the gate electrode 145 a (whichare respectively in contact with both recessed sidewalls 123 a of theepitaxial pattern 123) may be substantially equal to or less than thewidth W1 of the vertical structure 130. In the present modified example,the lowermost and second-lowermost horizontal structures 150 a maycorrespond to the ground selection line GSL of FIG. 1. The fabricatingmethod of the 3D semiconductor memory device according to the presentmodified example may be substantially the same as those of theaforementioned embodiments.

FIG. 18 illustrates a cross-sectional view illustrating a 3Dsemiconductor memory device according to an embodiment. FIG. 19illustrates an enlarged view of a portion ‘A’ of FIG. 18. FIG. 20illustrates a perspective view of a lower semiconductor pattern of a 3Dsemiconductor memory device according to an embodiment.

Referring to FIG. 18, a stack structure may be disposed on a substrate100. The stack structure may include lower and upper gate patterns 155Land 155U with insulating layers 112 therebetween.

The substrate 100 may be formed of a semiconductor material. Forexample, the substrate 100 may be a silicon substrate, a germaniumsubstrate, or a silicon-germanium substrate. The substrate 100 mayinclude a common source region 107 doped with dopants. A lowerinsulating layer 105 may be formed between the substrate 100 and thestack structure. For example, the lower insulating layer 105 may be asilicon oxide layer formed by a thermal oxidation process.Alternatively, the lower insulating layer 105 may be a silicon oxidelayer formed by a deposition technique. The lower insulating layer 105may be thinner than the insulating layers 112 thereon.

In a plan view, the stack structure may have a linear shape extending inone direction. A plurality of channel structures VCS may penetrate thestack structure and may be electrically connected to the substrate 100.The channel structures VCS penetrating the stack structure may bearranged in a line in the one direction. Alternatively, the channelstructures VCS may be arranged in a zigzag form along the one directionin a plan view, as illustrated in FIG. 21.

According to an embodiment, the stack structure may include the lowergate patterns 155L adjacent to a lower semiconductor pattern LSP, andthe upper gate patterns 155U adjacent to an upper semiconductor patternUSP. In an embodiment, the lower gate patterns 155L may be used as gateelectrodes of the ground selection transistors GST described withreference to FIG. 1. For example, in the 3D semiconductor memory device(e.g., a 3D NAND flash memory device), the lower gate patterns 155L maybe used as gate electrodes of the ground selection transistors GSTcontrolling electrical connection between the lower semiconductorpattern LSP and a dopant region (i.e., the common source region 107)formed in the substrate 100. Some of the upper gate patterns 155U may beused as the gate electrodes of the memory cell transistors MCT describedwith reference to FIG. 1. Additionally, the upper gate pattern 155Udisposed at an uppermost floor or level of the stack structure may beused as the gate electrode of the string selection transistor SSTdescribed with reference to FIG. 1. For example, the upper gate pattern155U disposed at the uppermost level of the stack structure may be usedas the gate electrode of the string selection transistor SST controllingelectrical connection between a bit line 175 and the channel structureVCS in the 3D flash memory device.

According to an embodiment, a horizontal width of each lower gatepattern 155L may be greater than a horizontal width of each upper gatepattern 155U. A vertical thickness of each lower gate pattern 155L maybe substantially equal to a vertical thickness of each upper gatepattern 155U. Alternatively, the vertical thickness of each lower gatepattern 155L may be greater than the vertical thickness of each uppergate pattern 155U.

According to an embodiment, each of the channel structures VCSpenetrating the stack structure may include the lower semiconductorpattern LSP penetrating a lower portion of the stack structure and theupper semiconductor pattern USP penetrating an upper portion of thestack structure. The upper semiconductor pattern USP may be electricallyconnected to the lower semiconductor pattern LSP, and the lowersemiconductor pattern may be electrically connected to the substrate100.

According to an embodiment, the upper semiconductor pattern USP may havea hollow pipe-shape or a hollow macaroni-shape. In this case, a bottomend of the upper semiconductor pattern USP may be in a closed state, andan inner space of the upper semiconductor pattern USP may be filled witha filling insulation pattern 135. A bottom surface of the uppersemiconductor pattern USP may be lower than a top surface of the lowersemiconductor pattern LSP, e.g., relative to a surface of the substrate100. For example, a bottom end portion of the upper semiconductorpattern USP may be inserted in the lower semiconductor pattern LSP. Inan implementation, the top surface of the lower semiconductor patternLSP may have a first portion contacting the bottom surface of the uppersemiconductor pattern USP and a second portion not contacting the bottomsurface of the upper semiconductor pattern USP. The first portion of thetop surface of the lower semiconductor pattern LSP (i.e., the bottomsurface of the upper semiconductor pattern USP) may be lower than thesecond portion of the top surface of the lower semiconductor patternLSP, e.g., relative to the surface of the substrate 100.

The upper semiconductor pattern USP may be formed of a semiconductormaterial. For example, the upper semiconductor pattern USP may includesilicon, germanium, or any combination thereof. The upper semiconductorpattern USP may be doped with dopants or may be in an undoped state(i.e., an intrinsic state). The upper semiconductor pattern USP may havea crystal structure of a single-crystalline structure, an amorphousstructure, and/or a polycrystalline structure. A conductive pad 137 maybe disposed on the upper semiconductor pattern USP. The conductive pad137 may be a dopant region doped with dopants or may be formed of aconductive material.

For example, the upper semiconductor pattern USP may include a firstsemiconductor pattern 131 and a second semiconductor pattern 133. Thefirst semiconductor pattern 131 may cover an inner sidewall of the stackstructure. The first semiconductor pattern 131 may have a pipe-shape (ora macaroni-shape) of which a top end and a bottom end are opened. Thefirst semiconductor pattern 131 may be spaced apart from the lowersemiconductor pattern LSP. For example, the first semiconductor pattern131 may not be in contact with the lower semiconductor pattern LSP. Abottom end of the second semiconductor pattern 133 may have a pipe-shape(or a macaroni-shape) of which a bottom end is closed. An inner space ofthe second semiconductor pattern 133 may be filled with the fillinginsulation pattern 135. The second semiconductor pattern 133 may be incontact with an inner sidewall of the first semiconductor pattern 131and the top surface of the lower semiconductor pattern LSP. For example,the second semiconductor pattern 133 may electrically connect the firstsemiconductor pattern 131 to the lower semiconductor pattern LSP.

The first and second semiconductor patterns 131 and 133 may be in anundoped state or may be doped with dopants of a same conductivity typeas the substrate 100. The first and second semiconductor patterns 131and 133 may be in a polycrystalline state or a single-crystalline state.

The lower semiconductor pattern LSP may be used as a channel region ofthe ground selection transistor GST described with reference to FIG. 1.The lower semiconductor pattern LSP may be formed of a semiconductormaterial having the same conductivity type as the substrate 100. In anembodiment, the lower semiconductor pattern LSP may be an epitaxialpattern formed by one of an epitaxial technique and a lasercrystallization technique which use the substrate 100 of a semiconductormaterial as a seed. In this case, the lower semiconductor pattern LSPmay have a single-crystalline structure, or a polycrystalline structurehaving a grain size greater than that of a semiconductor material formedby a chemical vapor deposition (CVD) technique. In another embodiment,the lower semiconductor pattern LSP may be formed of a semiconductormaterial having a polycrystalline structure, e.g., polycrystallinesilicon.

According to an embodiment, a bottom surface of the lower semiconductorpattern LSP may be lower than a top surface of the substrate 100. Thus,a bottom end portion of the lower semiconductor pattern LSP may beinserted in the substrate 100. The insulating layer 112 adjacent to thelower semiconductor pattern LSP may be in direct contact with a sidewallof the lower semiconductor pattern LSP. The sidewall of the lowersemiconductor pattern LSP may have a recessed region 146. The recessedregion 146 may be adjacent to the lower gate pattern 155L. The recessedregion 146 may be defined by incline-surfaces 146S inclined with respectto the top surface of the substrate 100.

For example, referring to FIGS. 19 and 20, the maximum width W2 of thelower semiconductor pattern LSP may be greater than the maximum width(i.e., an upper width) W1 of the upper semiconductor pattern USP. Adistance T1 between vertically adjacent insulating layers 112 may beless than the maximum width W2 of the lower semiconductor pattern LSP.Here, the minimum width (i.e., a width at the recessed region 146) W3 ofthe lower semiconductor pattern LSP may be less than the upper width W1of the upper semiconductor pattern USP. The minimum width W3 of thelower semiconductor pattern LSP may be determined depending on thedistance T1 between the vertically adjacent insulating layers 112 andthe maximum width W2 of the lower semiconductor pattern LSP. Thus, thedistance T1 between the insulating layers 112 may be reduced and/or themaximum width W2 of the lower semiconductor pattern LSP may increase inorder to ensure that the minimum width W3 of the lower semiconductorpattern LSP is secured. In an embodiment, the minimum width W3 of thelower semiconductor pattern LSP may correspond to or be about equal to adifference between the maximum width W2 of the lower semiconductorpattern LSP and the distance T1 between the vertically adjacentinsulating layers 112 (W3=W2−T1).

According to an embodiment, the recessed region 146 of the lowersemiconductor pattern LSP may have a tapered wedge-shape by theincline-surfaces 146S adjacent to each other. In an embodiment, if thelower semiconductor pattern LSP is formed of silicon, theincline-surfaces 146S defining the recessed region 146 may be {111}crystal planes of silicon. A horizontal section of the lowersemiconductor pattern LSP adjacent to the insulating layer 112 may havea circular shape, and a horizontal section of the lower semiconductorpattern LSP at which the recessed region 146 is formed may have aquadrilateral shape whose sides are parallel to <110> directionscrossing each other.

Referring again to FIG. 18, a vertical insulator 121 may be disposedbetween the stack structure and the upper semiconductor pattern USP. Thevertical insulator 121 may have a pipe-shape (or a macaroni-shape) ofwhich a top end and a bottom end are opened. In an embodiment, thevertical insulator 121 may be in contact with the top surface of thelower semiconductor pattern LSP.

According to an embodiment, the vertical insulator 121 may include amemory element of a flash memory device. For example, the verticalinsulator 121 may include a charge storage layer of the flash memorydevice. For example, the charge storage layer may include a trapinsulating layer, or an insulating layer including conductive nano dots.Data stored in the vertical insulator 121 may be changed usingFowler-Nordheim (FN) tunneling caused by a voltage difference betweenthe upper semiconductor pattern USP and the gate pattern. Alternatively,the vertical insulator 121 may include a thin layer capable of storingdata by another operation principle. For example, the vertical insulator121 may include a thin layer for a phase change memory element or a thinlayer for a variable resistance memory element.

According to an embodiment, the vertical insulator 121 may include thecharge storage layer CTL and a tunnel insulating layer TIL, which aresequentially stacked. The tunnel insulating layer TIL may be in directcontact with the channel structure VCS (e.g., the upper semiconductorpattern USP), and the charge storage layer CTL may be disposed betweenthe upper gate pattern 155U and the tunnel insulating layer TIL.According to another embodiment, the vertical insulator 121 may includea blocking insulating layer BIL, a charge storage layer CTL, and atunnel insulating layer, which are sequentially stacked, as illustratedin FIG. 39. The tunnel insulating layer TIL may be in direct contactwith the channel structure VCS (e.g., the upper semiconductor patternUSP), and the charge storage layer CTL may be disposed between thetunnel insulating layer TIL and the blocking insulating layer BIL.

The charge storage layer CTL may include a trap insulating layer, and/oran insulating layer including conductive nano dots. For example, thecharge storage layer CTL may include at least one of a silicon nitridelayer, a silicon oxynitride layer, a silicon-rich nitride layer, anano-crystalline silicon layer, and a laminated trap layer. The tunnelinsulating layer TIL may include at least one material having energyband gaps greater than that of the charge storage layer CTL. Forexample, the tunnel insulating layer TIL may include a silicon oxidelayer. The blocking insulating layer BIL may include at least onematerial having energy band gaps greater than that of the charge storagelayer CTL. For example, the blocking insulating layer BIL may include asilicon oxide layer.

Meanwhile, the vertical insulator 121 may further include a cappinglayer pattern CP disposed between the upper semiconductor pattern USPand each of the insulating layers 112, as illustrated in FIGS. 19 and39. The capping layer patterns CP may be in direct contact with theinsulating layers 112 and may be vertically separated from each other bythe upper gate patterns 155U. In another embodiment, a capping layer CPLmay vertically extend to be disposed between the upper semiconductorpattern USP and the upper gate pattern 155U, as illustrated in FIG. 35.The capping layer pattern CP (or the capping layer CPL) may include aninsulating material which has an etch selectivity with respect to thecharge storage layer CTL and is different from the insulating layer 112.In an embodiment, the capping layer pattern CP (or the capping layerCPL) may include at least one of a silicon layer, a silicon oxide layer,a polysilicon layer, a silicon carbide layer, and a silicon nitridelayer and is different from the insulating layer 112. In anotherembodiment, the capping layer pattern CP (or the capping layer CPL) mayinclude a high-k dielectric material such as tantalum oxide (Ta₂O₅),titanium oxide (TiO₂), hafnium oxide (HfO₂), and/or zirconium oxide(ZrO₂).

Referring to FIGS. 18 and 19, a horizontal insulator 151 may conformallycover top surfaces and bottom surfaces of the lower and upper gatepatterns 155L and 155U. A portion of the horizontal insulator 151 mayextend between the vertical insulator 121 and each of the upper gatepatterns 155U. Another portion of the horizontal insulator 151 mayextend between the lower semiconductor pattern LSP and each of the lowergate patterns 155L. The horizontal insulator 151 may include a singlethin layer or a plurality of thin layers. In an embodiment, thehorizontal insulator 151 may include a blocking insulating layer of acharge trap type flash memory element, as illustrated in FIG. 19. Inanother embodiment, the horizontal insulator 151 may include a pluralityof blocking insulating layers BIL1 and BIL2, as illustrated in FIG. 38.In still another embodiment, the horizontal insulator 151 may includethe charge storage layer CTL and the blocking insulating layer BIL ofthe charge trap type flash memory element, as illustrated in FIG. 41.

An electrode isolation pattern 160 may fill a space between the stackstructures. For example, the electrode isolation pattern 160 may bedisposed between the lower gate patterns 155L horizontally adjacent toeach other and between the upper gate patterns 155U horizontallyadjacent to each other. The electrode isolation pattern 160 may beformed of an insulating material and may cover the common source region107. Additionally, the bit lines 175 may cross over the stack structure.The bit lines 175 may be connected to the conductive pads 137 disposedon the upper semiconductor patterns USP through contact plugs 171.

FIGS. 22 to 30 illustrate cross-sectional views of stages in a methodfor fabricating a 3D semiconductor memory device according to anembodiment. FIGS. 31 to 35 illustrate partial cross-sectional views ofstages in a method for fabricating a 3D semiconductor memory deviceaccording to an embodiment.

Referring to FIG. 22, sacrificial layers 111 and insulating layers 112may be alternately and repeatedly stacked on a substrate 100 to form amulti-layered structure 110.

The substrate 100 may include at least one of materials havingsemiconductor properties, insulating materials, and a semiconductor orconductor covered by an insulating material. For example, the substrate100 may be a silicon substrate, a germanium substrate, or asilicon-germanium substrate.

The sacrificial layers 111 may be formed of a material having an etchselectivity with respect to the insulating layers 112. In an embodiment,the sacrificial layers 111 and the insulating layers 112 may have a highetch selectivity with respect to each other in a wet etching processusing a chemical solution, but may have a low etch selectivity withrespect to each other in a dry etching process using an etching gas.

In an embodiment, thicknesses of the sacrificial layers 111 may havesubstantially equal to each other. In another embodiment, a lowermostone and an uppermost one of the sacrificial layers 111 may be thickerthan other one of the sacrificial layers 111 therebetween. Thicknessesof the insulating layer 112 may be substantially equal to each other.Alternatively, at least one of the insulating layers 112 may have athickness different from those of other ones of the insulating layers112.

The sacrificial layers 111 and the insulating layers 112 may bedeposited using a thermal chemical vapor deposition (thermal CVD)technique, a plasma enhanced-CVD (PE-CVD) technique, a physical CVDtechnique, and/or an atomic layer deposition (ALD) technique.

In an embodiment, the sacrificial layers 111 and the insulating layers112 may be formed of insulating materials, and the sacrificial layers111 may have an etch selectivity with respect to the insulating layers112. For example, each of the sacrificial layers 111 may include atleast one of a silicon layer, a silicon oxide layer, a silicon carbidelayer, a silicon nitride layer, and a silicon oxynitride layer. Theinsulating layers 112 may include at least one of a silicon layer, asilicon oxide layer, a silicon carbide layer, a silicon nitride layer,and a silicon oxynitride layer. For example, the insulating layers 112may include a material different from the sacrificial layers 111. In anembodiment, the sacrificial layers 111 may be formed of silicon nitridelayers, and the insulating layers 112 may be formed of silicon oxidelayers. In another embodiment, the sacrificial layers 111 may be formedof a conductive material, and the insulating layers 112 may be formed ofan insulating material.

A lower insulating layer 105 may be formed between the substrate 100 andthe multi-layered structure 110. For example, the lower insulating layer105 may be a silicon oxide layer formed by a thermal oxidation process.Alternatively, the lower insulating layer 105 may be a silicon oxidelayer formed by a deposition technique. The lower insulating layer 105may be thinner than the sacrificial layers 111 and the insulating layers112 formed thereon.

Referring to FIG. 23, openings 115 may be formed to penetrate themulti-layered structure 110. The openings 115 may expose the substrate100.

According to the present embodiment, the openings 115 may be formed tohave hole-shapes. A depth of the opening 115 may be five or more timesgreater than a width of the opening 115. Additionally, the openings 115may be two-dimensionally arranged on a top surface of the substrate 100(i.e., an x-y plane) in a plan view. For example, the openings 115 maybe arranged along an x-direction and a y-direction in a plan view andmay be spaced apart from each other. In another embodiment, asillustrated in FIG. 21, the openings 115 may be arranged in a zigzagform along the y-direction. In this case, a distance between theopenings 115 adjacent to each other may be equal to or less than thewidth of the opening 115.

A mask pattern (not shown) may be formed on the multi-layered structure110, and then the multi-layered structure 110 may be anisotropicallyetched using the mask pattern (not shown) as an etch mask, therebyforming the openings 115. The top surface of the substrate 100 may beover-etched during the anisotropic etching process for the openings 115.Thus, portions of the substrate 100 exposed by the openings 115 may berecessed by a predetermined depth. In an implementation, a lower widthof the opening 115 may be narrower than an upper width of the opening115 by the anisotropic etching process.

Referring to FIG. 24, a lower semiconductor layer 117 may be formed tofill a lower region of each opening 115.

The lower semiconductor layer 117 may be in direct contact with thesacrificial layers 111 and the insulating layers 112 disposed in a lowerportion of the multi-layered structure 110. The lower semiconductorlayer 117 may cover a sidewall of at least one sacrificial layer 111. Atop surface of the lower semiconductor layer 117 may be disposed at alevel between the sacrificial layers 111 vertically adjacent to eachother.

For example, the lower semiconductor layer 117 may be formed by aselective epitaxial growth (SEG) process using the substrate 100 exposedby each opening 115 as a seed. Thus, the lower semiconductor layer 117may have a pillar-shape filling the lower region of each opening 115 andan etched region of the substrate 100. In this case, the lowersemiconductor layer 117 may have a single-crystalline structure, or apolycrystalline structure having a grain size greater than that of asemiconductor layer formed by a chemical vapor deposition (CVD)technique. On the other hand, the lower semiconductor layer 117 may beformed of silicon. However, the embodiments are not limited thereto. Inother embodiments, carbon nano structures, organic semiconductormaterials, and/or compound semiconductors may be used for the lowersemiconductor layer 117. In still other embodiments, the lowersemiconductor layer 117 may be formed of a semiconductor material havinga polycrystalline structure, e.g., polycrystalline silicon.

In an embodiment, the lower semiconductor layer 117 may be formed by aSEG process using a single-crystalline silicon substrate 100 having oneof <100> directions as a seed. In this case, the top surface of thelower semiconductor layer 117 may have the <100> direction.

Additionally, the lower semiconductor layer 117 may have the sameconductivity type as the substrate 100. The lower semiconductor layer117 may be doped with dopants in-situ during the SEG process.Alternatively, after the lower semiconductor layer 117 is formed, dopantions may be implanted into the lower semiconductor layer 117.

Referring to FIGS. 25 and 31, a vertical insulator 121 and a firstsemiconductor pattern 131 may be formed in each of the openings 115. Thevertical insulator 121 and the first semiconductor pattern 131 may coveran inner sidewall of the opening 115 and may expose the top surface ofthe lower semiconductor layer 117.

For example, a vertical insulating layer and a first semiconductor layermay be sequentially formed to cover inner sidewalls of the openings 115having the lower semiconductor layers 117. The vertical insulating layerand the first semiconductor layer may partially fill the opening s 115.A sum of deposition thicknesses of the vertical insulating layer and thefirst semiconductor layer may be less than a half of the width of theopening 115. Thus, the openings 115 may not be completely filled withthe vertical insulating layer and the first semiconductor layer.Additionally, the vertical insulating layer may cover the top surfacesof the lower semiconductor layers 117 exposed by the openings 115. Thevertical insulating layer may include a plurality of thin layers. Thevertical insulating layer may be deposited by a PE-CVD technique, aphysical CVD technique, and/or an ALD technique.

The vertical insulating layer may include a charge storage layer used asa memory element of a flash memory device. For example, the chargestorage layer may be a trap insulating layer, or an insulating layerincluding conductive nano dots. Alternatively, the vertical insulatinglayer may include a thin layer for a phase change memory element or athin layer for a variable resistance memory element.

In an embodiment, as illustrated in FIG. 31, the vertical insulatinglayer may include a capping layer CPL, a charge storage layer CTL, and atunnel insulating layer TIL, which are sequentially stacked. The cappinglayer CPL may cover sidewalls of the sacrificial layers 111 and theinsulating layer 112 and the top surface of the lower semiconductorlayer 117, which are exposed by the opening. The capping layer CPL maybe formed of a material having an etch selectivity with respect to thesacrificial layer 111 and the charge storage layer CTL. For example, thecapping layer CPL may be formed of a high-k dielectric layer such as atantalum oxide (Ta₂O₅) layer, a titanium oxide (TiO₂) layer, a hafniumoxide (HfO₂) layer, and/or a zirconium oxide (ZrO₂) layer. The chargestorage layer CTL may be a trap insulating layer, or an insulating layerincluding conductive nano dots. For example, the charge storage layerCTL may include at least one of a silicon nitride layer, a siliconoxynitride layer, a silicon-rich nitride layer, a nano-crystallinesilicon layer, and a laminated trap layer. The tunnel insulating layerTIL may include materials having energy band gaps greater than that ofthe charge storage layer CTL. For example, the tunnel insulating layerTIL may include a silicon oxide layer.

The first semiconductor layer may be conformally formed on the verticalinsulating layer. In an embodiment, the first semiconductor layer may beformed by an ALD technique or a CVD technique. For example, the firstsemiconductor layer may be a polycrystalline silicon layer, asingle-crystalline silicon layer, or an amorphous silicon layer.

After the vertical insulating layer and the first semiconductor layerare sequentially formed, the first semiconductor layer and the verticalinsulating layer on the top surface of the lower semiconductor layer 117may be anisotropically etched to expose the top surface of the lowersemiconductor layer 117. Thus, the vertical insulator 121 and the firstsemiconductor pattern 131 may be formed on the inner sidewall of theopening 115. For example, each of the vertical insulator 121 and thefirst semiconductor pattern 131 may have a cylindrical shape havingopened top and bottom ends. Additionally, the top surface of the lowersemiconductor layer 117 (exposed by the first semiconductor pattern 131)may be recessed by over-etching during the anisotropic etching processof the first semiconductor layer and the vertical insulating layer.

Meanwhile, a portion of the vertical insulating layer under the firstsemiconductor pattern 131 may not be etched during the anisotropicetching process. In this case, the vertical insulator 121 may have abottom part disposed between a bottom surface of the first semiconductorpattern 131 and the top surface of the lower semiconductor layer 117.

Additionally, a top surface of the multi-layered structure 110 may beexposed by the anisotropic etching process performed on the firstsemiconductor layer and the vertical insulating layer. Thus, thevertical insulator 121 and the first semiconductor pattern 131 may beconfinedly formed in each of the openings 115. For example, the verticalinsulators 121 and the first semiconductor patterns 131 in the openings115 may be two-dimensionally arranged in a plan view.

On the other hand, after the vertical insulator 121 is formed, thebottom part of the vertical insulator 121 may be removed according to anembodiment illustrated in FIG. 42. For example, the bottom part of thevertical insulator 121 (disposed between the first semiconductor pattern131 and the lower semiconductor layer 117) may be isotropically etchedto form an undercut region. Thus, a vertical length of the verticalinsulator 121 may be reduced, and the vertical insulator 121 may bespaced apart from the lower semiconductor layer 117, as illustrated inFIG. 42. The undercut region may be filled with a second semiconductorpattern 133 formed in a subsequent process.

Referring to FIGS. 26 and 32, a second semiconductor pattern 133 and afilling insulating pattern 134 may be formed on the substrate 100 havingthe vertical insulator 121 and the first semiconductor pattern 131.

For example, a second semiconductor layer and a filling insulation layermay be sequentially formed to fill the openings 115 having the verticalinsulators 121 and the first semiconductor patterns 131 therein.Subsequently, the second semiconductor layer and the filling insulationlayer may be planarized until the top surface of the multi-layeredstructure 110 is exposed, thereby forming the second semiconductorpattern 133 and the filling insulation pattern 135.

The second semiconductor layer may be conformally formed in the openings115. The second semiconductor layer may electrically connect the lowersemiconductor layer 117 to the first semiconductor pattern 131. Thesecond semiconductor layer may be formed by an ALD technique or a CVDtechnique. The second semiconductor layer may be a polycrystallinesilicon layer, a single-crystalline silicon layer, or an amorphoussilicon layer.

The second semiconductor pattern 133 may be formed to have a pipe-shape,a hollow cylindrical shape, or a cup shape, in each of the openings 115.In another embodiment, the second semiconductor pattern 133 may beformed to have a pillar-shape filling the opening 115.

The filling insulation pattern 135 may fill the opening 115 in which thesecond semiconductor pattern 133 is formed. The filling insulationpattern 135 may include at least one of silicon oxide and insulatingmaterials formed using a spin-on glass (SOG) technique.

The first and second semiconductor patterns 131 and 133 may constitutean upper semiconductor pattern USP disposed on the lower semiconductorlayer 117. The upper semiconductor pattern USP is formed in the opening115 having the vertical insulator 121. Thus, the maximum width W1 (i.e.,an upper width) of the upper semiconductor pattern USP may be less thanthe maximum width W2 of the lower semiconductor layer 117.

Referring to FIG. 27, the multi-layered structure 110 may be patternedto form trenches 140 exposing the substrate 100 between the openings115.

For example, a mask pattern (not shown) defining the trenches 140 may beformed on the multi-layered structure 110, and then the multi-layeredstructure 110 may be anisotropically etched using the mask pattern as anetch mask to form the trenches 140.

The trenches 140 may be spaced apart from the first and secondsemiconductor patterns 131 and 133, and may expose sidewalls of thesacrificial layers 111 and the insulating layers 112. Each of thetrenches 140 may have a linear shape or a rectangular shape in a planview. The trenches 140 may expose a surface, e.g., a top surface, of thesubstrate 100 in a cross-sectional view. The surface of the substrate100 exposed by the trenches 130 may be recessed by over-etching duringthe formation of the trenches 140. Additionally, the trench 140 may havedifferent widths from each other according to a distance from thesubstrate 100 by the anisotropic etching process.

The multi-layered structure 110 may have a linear shape extending in onedirection when viewed from a plan view due to the presence of thetrenches 140. A plurality of the upper semiconductor patterns USP maypenetrate one multi-layered structure 110 having the linear shape.

Referring to FIGS. 28 and 33, the sacrificial layers 111 exposed by thetrenches 140 may be removed to form lower and upper gate regions 145Land 145U between the insulating layers 112.

For example, the sacrificial layers 111 may be isotropically etchedusing an etch-recipe or etchant having an etch selectivity with respectto the insulating layers 112, the vertical insulators 121, the lowersemiconductor layers 117, and the substrate 100, thereby forming thelower and upper gate regions 145L and 145U. At this time, thesacrificial layers 111 may be completely removed by the isotropicetching process. For example, if the sacrificial layers 111 are siliconnitride layers and the insulating layers 112 are silicon oxide layers,the isotropic etching process for the removal of the sacrificial layers112 may be performed using an etching solution including phosphoricacid.

The lower gate regions 145L may horizontally extend from the trench 140between the insulating layers 112 and may expose portions of a sidewallof the lower semiconductor layer 117, respectively. The upper gateregions 145U may horizontally extend from the trench 140 between theinsulating layers 112 and may expose portions of a sidewall of thevertical insulator 121, respectively. For example, each of the lowergate regions 145L may be defined by the insulating layers 112 verticallyadjacent to each other and the sidewall of the lower semiconductor layer117. Each of the upper gate regions 145U may be defined by theinsulating layers 112 vertically adjacent to each other and the sidewallof the vertical insulator 121. Additionally, according to the embodimentillustrated in FIG. 33, the capping layer CPL may be used as an etchstop layer during the isotropic etching process for the formation of theupper gate regions 145U. Thus, the capping layer CPL may help preventthe charge storage layer CTL from being damaged by the etching solutionused in the isotropic etching process. For example, the upper gateregions 145U may expose the capping layer CPL of the vertical insulator121.

In an embodiment, a vertical height of each of the lower and upper gateregions 145L and 145U may be less than a maximum width of the lowersemiconductor layer 117. The vertical heights of the lower and uppergate regions 145L and 145U may be substantially equal to the thicknessesof the sacrificial layers 111, respectively. The vertical heights of thelower and upper gate regions 145L and 145U may be substantially equal toeach other. In another embodiment, the vertical height of the lower gateregion 145L may be greater than the vertical height of the upper gateregion 145U.

Referring to FIGS. 29 and 34, the sidewall of the lower semiconductorlayer 117 exposed by the lower gate regions 145L may be recessed to forma lower semiconductor pattern LSP having recessed regions 146.

In an embodiment, forming the recess regions 146 at the lowersemiconductor layer 117 may include selectively etching the sidewall ofthe lower semiconductor layer 117 exposed by the lower gate regions145L. Here, the etching process for the formation of the recessed region146 may use an etch-recipe or etchant having an etch rate variedaccording to a crystal direction of a semiconductor material. Thus, therecessed region 146 may be defined by incline-surfaces 146S inclinedwith respect to the top surface of the substrate 100. The recessedregion 146 may have a tapered wedge-shape due to the incline-surfaces146S. In an embodiment, the incline-surfaces 146S defining the recessedregion 146 may be {111} crystal planes of silicon. Additionally, ahorizontal section of the lower semiconductor pattern LSP (at which therecessed region 146 is formed) may have a quadrilateral shape whosesides are parallel to the <110> directions crossing each other, asillustrated in FIG. 20.

For example, the recessed region 146 may be formed by a gas phaseetching process or chemical dry etching process using an etchantincluding a halogen containing reaction gas. The halogen containingreaction gas may include at least one of HCl, Cl₂, NF₃, ClF₃, and F₂.Alternatively, the recessed region 146 may be formed by a wetanisotropic etching process using an etching solution such as an organicalkali etchant (e.g., tetramethyl ammonium hydroxide (TMAH)) or ammoniumhydroxide (NH₄OH).

When the lower semiconductor layer 117 formed of silicon is selectivelyetched, the etch rate of the lower semiconductor layer 117 may be variedaccording to a crystal plane and a crystal direction of silicon. In anembodiment, when the exposed sidewall of the lower semiconductor layer117 is etched using the halogen containing reaction gas, the etch ratein <111> directions may be greater than the etch rate in <110>directions. In this case, the etching process may be stopped at the{111} crystal planes. Thus, the {111} crystal planes of the lowersemiconductor pattern LSP may be exposed. For example, the recessedregion 146 may be defined by the {111} crystal planes and may have thetapered wedge-shape by two incline-surfaces 146S having the {111}crystal planes.

In another embodiment, when the lower semiconductor layer 117 formed ofsilicon is isotropically etched using ammonium hydroxide (NH₄OH), theetch rate of the lower semiconductor layer 117 may be the minimum at the{111} crystal planes and the etch rate of the lower semiconductor layer117 may be the maximum at {100} crystal planes. Thus, inner surfaces ofthe recessed region 146 may have the {111} crystal planes at which theeach rate is the minimum. Additionally, the recessed region 146 may havethe tapered wedge-shape by two inner surfaces of the {111} crystalplanes.

The inner surfaces of the recessed region 146 may have defects by theetching process. Thus, after the recessed region 146 is formed, acleaning process using O₃ and HF may be performed to remove the defectsof the inner surfaces of the recessed region 146.

As noted above, the lower semiconductor pattern LSP is formed to havethe recessed region 146. Thus, the minimum width W3 of the lowersemiconductor pattern LSP may be less than the upper width W1 of theupper semiconductor pattern USP. In an embodiment, a depth (i.e., alateral depth) of the recessed region 146 may be determined depending ona distance T1 between the vertically adjacent insulating layers 112(i.e., a height T1 of the lower gate region 145L) and the maximum widthW2 of the lower semiconductor pattern LSP. For example, the depth of therecessed region 146 may correspond to about a half of the height T1 ofthe lower gate region 145L. For example, the minimum width W3 of thelower semiconductor pattern LSP may correspond to or equal a differencebetween the maximum width W2 of the lower semiconductor pattern LSP andthe height T1 of the lower gate region 145L.

Referring to FIGS. 30 and 35, a horizontal insulating layer 151 may beformed to cover inner surfaces of the lower and upper gate regions 145Land 145U, and lower and upper gate patterns 155L and 155U may be formedto fill remaining spaces of the lower and upper gate regions 145L and145U, respectively.

For example, a horizontal insulating layer 151 and a conductive layermay be sequentially formed to cover the inner surfaces of the lower andupper gate regions 145L and 145U. Then, the conductive layer outside thelower and upper gate regions 145L and 145U may be removed to confinedlyform the lower and upper gate patterns 155L and 155U in the lower andupper gate regions 145L and 145U, respectively.

In an embodiment, the horizontal insulating layer 151 may be in directcontact with the vertical insulator 121 in the upper gate regions 145U.In an embodiment, as illustrated in FIG. 35, the horizontal insulatinglayer 151 may be in direct contact with the capping layer CPL of thevertical insulator 121. The horizontal insulating layer 151 may be indirect contact with the lower semiconductor pattern LSP in the lowergate regions 145L. For example, the horizontal insulating layer 151 mayconformally cover the recessed regions 145 of the lower semiconductorpattern LSP in the lower gate regions 145L. The horizontal insulatinglayer 151 may include a single thin layer or a plurality of thin layers,similarly to the vertical insulating layer. In an embodiment, thehorizontal insulating layer 151 may include a blocking insulating layerBIL of a charge trap type flash memory element. The blocking insulatinglayer BIL may include a material having an energy band gap less thanthat of the tunnel insulating layer TIL and greater than that of thecharge storage layer CTL. For example, the blocking insulating layer BILmay include at least one of high-k dielectric layers such as an aluminumoxide layer and a hafnium oxide layer.

In an embodiment, the conductive layer may fill the lower and upper gateregions 145L and 145U and may conformally cover an inner surface of thetrench 140. In this case, the conductive layer in the trenches 140 maybe isotropically etched to form the lower and upper gate patterns 155Land 155U. In another embodiment, the conductive layer may also fill thetrenches 140. In this case, the conductive layer in the trenches 140 maybe anisotropically etched to form the lower and upper gate patterns 155Land 155U. According to an embodiment, the upper gate patterns 155U maybe formed in the upper gate regions 145U, respectively, and the lowergate patterns 155L may be formed in the lower gate regions 145L,respectively. Here, the lower gate patterns 155L may fill the recessedregions 146 of the lower semiconductor pattern LSP. Thus, the lower gatepatterns 155L may have sidewalls tapered toward the lower semiconductorpattern LSP, respectively. For example, the lower gate pattern 155L mayhave sidewalls which are parallel to the incline-surfaces 146S,respectively. Thus, a horizontal width of the lower gate pattern 155Lmay be greater than a horizontal width of the upper gate pattern 155U.In an embodiment, forming the conductive layer may include sequentiallydepositing a barrier metal layer and a metal layer. For example, thebarrier metal layer may include a metal nitride layer such as a titaniumnitride layer, a tantalum nitride layer, or a tungsten nitride layer.For example, the metal layer may include a metal such as tungsten,aluminum, titanium, tantalum, cobalt, or copper.

Referring to FIG. 30, after the lower and upper gate patterns 155L and155U are formed, dopant regions 107 may be formed in the substrate 100.The dopant regions 107 may be formed in the substrate 100 under thetrenches 140 by an ion implantation process. The dopant regions 107 mayhave a conductivity type different from that of the lower semiconductorpattern LSP. The dopant regions 107 and the substrate 100 may constitutePN-junctions. On the other hand, a portion of the substrate 100, whichis in contact with the lower semiconductor pattern LSP, may have thesame conductivity type as the lower semiconductor pattern LSP. In anembodiment, the dopant regions 107 may be connected to each other to bein an equipotential state. In another embodiment, the dopant regions 107may be electrically separated from each other in order to havepotentials different from each other, respectively. In still anotherembodiment, the dopant regions 107 may be classified into a plurality ofsource groups. Each of the source groups may include a plurality ofdopant regions 107. The plurality of source groups may be electricallyseparated from each other in order to have potentials different fromeach other, respectively.

Referring again to FIG. 18, an electrode isolation pattern 160 may beformed on the dopant regions 107 to fill the trenches 140. The electrodeisolation pattern 160 may include at least one of a silicon oxide layer,a silicon nitride layer, and a silicon oxynitride layer.

Additionally, a conductive pad 137 may be formed to be connected to thefirst and second semiconductor patterns 131 and 133 of each uppersemiconductor pattern USP. Upper portions of the first and secondsemiconductor patterns 131 and 133 may be recessed, and then therecessed space may be filled with a conductive material to form theconductive pad 137. The conductive pad 137 may be doped with dopants ofa conductivity type different from those of the first and secondsemiconductor patterns 131 and 133 thereunder. Thus, the conductive pad137 and the semiconductor patterns 131 and 133 may constitute a diode.

Subsequently, contact plugs 171 may be formed to be connected to theconductive pads 137, respectively, and then a bit line 175 may be formedto be connected to the contact plugs 171. The bit line 175 may beelectrically connected to the first and second semiconductor patterns131 and 133 through the contact plug 171. The bit line 175 may crossover the lower and upper gate patterns 155L and 155U and/or the trenches140.

FIGS. 36 to 38 illustrate partial cross-sectional views of stages in amethod for fabricating a 3D semiconductor memory device according to anembodiment. FIGS. 39 to 42 illustrate partial cross-sectional views of3D semiconductor memory devices according to an embodiment.

In the present embodiment, horizontal widths and heights of the lowerand upper gate regions 145L and 145U may increase after the lower andupper gate regions 145L and 145U are formed between the insulatinglayers 112, as described with reference to FIG. 34.

For example, referring to FIG. 36, portions of the capping layers CPLand insulating layers 112 exposed by the lower and upper gate regions145L and 145U may be isotropically etched to form enlarged lower gateregions 147L, enlarged upper gate regions 147U, and capping layerpatterns CP. A vertical height T2 of each of the enlarged lower andupper gate regions 147L and 147U may be greater than the vertical heightT1 of each of the lower and upper gate regions 145L and 145U. Here, adifference between the vertical height T1 of each gate region before theformation of the capping layer pattern CP and the vertical height T2 ofeach gate region after the formation of the capping layer pattern CP maybe about twice thickness of the capping layer CPL.

In an embodiment, if the vertical insulator 121 includes the cappinglayer CPL, the charge storage layer CTL, and the tunnel insulating layerTIL, portions of the capping layer CPL may be etched to expose portionsof the charge storage layers CTL in the forming process of the enlargedlower and upper gate regions 147L and 147U. Thus, the capping layerpatterns CP may be formed between the charge storage layer CTL and theinsulating layers 112 when the enlarged upper gate regions 147U areformed.

In another embodiment, if the vertical insulator 121 includes thecapping layer CPL, the blocking insulating layer BIL, the charge storagelayer CTL, and the tunnel insulating layer TIL, the portions of thecapping layer CPL may be etched to form enlarged lower and upper gateregions 147L and 147U exposing portions of the blocking insulating layerBIL, as illustrated in FIG. 39. In this case, the capping layer patternsCP may be formed between the blocking insulating layer BIL and theinsulating layers 112, respectively. In still another embodiment, thecapping layer CPL and the blocking insulating layer BIL may be etched toenlarged lower and upper gate regions 147L and 147U exposing portions ofthe charge storage layer CTL, as illustrated in FIG. 40. In this case,the capping layer pattern CP and a blocking insulating layer pattern BIPmay be formed between the charge storage layer CTL and each of theinsulating layers 112.

Referring to FIG. 37, after the enlarged lower and upper gate regions147L and 147U are formed, the lower semiconductor layer 117 exposed bythe enlarged lower gate region 147L may be selectively etched to form arecessed region 146. The minimum width W4 of the lower semiconductorpattern LSP having the recessed region 146 may be less than the upperwidth W1 of the upper semiconductor pattern USP. As described withreference to FIG. 18, the recessed region 146 of the lower semiconductorpattern LSP may be formed using the etch-recipe or etchant having theetch rate varied according to the crystal direction of the semiconductormaterial. Thus, the recessed region 146 may be defined byincline-surfaces 146S inclined with respect to the top surface of thesubstrate 100. The recessed region 146 may have a tapered wedge-shapedue to the incline-surfaces 146S. In an embodiment, the incline-surfaces146S defining the recessed region 146 may be {111} crystal planes ofsilicon. Additionally, a horizontal section of the lower semiconductorpattern LSP at which the recessed region 146 is formed may have aquadrilateral shape of which sides are parallel to the <110> directionscrossing each other.

According to the present embodiment, the vertical height T2 of theenlarged lower gate region 147L may increase, such that the lateraldepth of the recessed region 146 of the lower semiconductor pattern LSPmay increase. For example, the minimum width W4 of the lowersemiconductor pattern LSP in FIG. 37 may be less than the minimum widthW3 of the lower semiconductor pattern LSP in FIG. 18.

After the lower semiconductor pattern LSP having the recessed region 146is formed, the horizontal insulating layer 151 and the lower and uppergate patterns 155L and 155U may be formed, as described with referenceto FIG. 14. Forming the horizontal insulating layer 151 may includeconformally depositing a first blocking insulating layer BIL1 and asecond blocking insulating layer BIL2 in the enlarged lower and uppergate regions 147L and 147U, as illustrated in FIG. 46. The first andsecond blocking insulating layers BIL1 and BIL2 may be formed ofmaterials different from each other, respectively. One of the first andsecond blocking insulating layers BIL1 and BIL2 may be formed of amaterial having an energy band gap less than that of the tunnelinsulating layer TIL and greater than that of the charge storage layerCTL. In an embodiment, the first blocking insulating layer BIL1 mayinclude at least one of high-k dielectric layers such as an aluminumoxide layer and a hafnium oxide layer, and the second blockinginsulating layer BIL2 may include a material having a dielectricconstant less than that of the first blocking insulating layer BIL1. Inanother embodiment, the second blocking insulating layer BIL2 mayinclude at least one high-k dielectric layer, and the first blockinginsulating layer BIL1 may include a material having a dielectricconstant less than that of the second blocking insulating layer BIL2.

According to the embodiments illustrated in FIGS. 18 to 42, the minimumwidth of the lower semiconductor pattern (used as a channel of theselection transistor) may be less than the minimum width of the uppersemiconductor pattern (used as a channel of the cell transistor). Thus,a margin between the lower gate patterns adjacent to the lowersemiconductor pattern may increase or be secured.

A portion of the sidewall of the lower semiconductor pattern may beetched such that the width of the lower semiconductor pattern becomesless than the width of the upper semiconductor pattern. At this time,the etch-recipe or etchant having the etch rate varied according to thecrystal planes and the crystal directions of silicon may be used. Thus,the etching process for reducing the width of the lower semiconductorpattern may be automatically controlled without monitoring of the widthof the lower semiconductor pattern. For example, specific crystal planesof silicon may be used as etch stop planes when the lower semiconductorpattern is etched.

Hereinafter, methods for fabricating a 3D semiconductor memory deviceaccording to an embodiment will be described with reference to FIGS. 22to 30 and 43 to 49.

FIGS. 43 to 46 illustrate partial cross-sectional views of stages in amethod for fabricating a 3D semiconductor memory device according to anembodiment.

In the present embodiment, the multi-layered structure 110 may bepatterned to form the trenches 140 exposing the substrate 100 asillustrated in FIG. 27, and then the sacrificial layers 111 exposed bythe trenches 140 may be removed to form the lower and upper gate regions145L and 145U between the insulating layers 112, as illustrated in FIGS.28 and 43.

For example, the sacrificial layers 111 may be isotropically etchedusing an etch-recipe or etchant having an etch selectivity with respectto the insulating layers 112, the vertical insulators 121, the lowersemiconductor layers 117, and the substrate 100, thereby forming thelower and upper gate regions 145L and 145U. At this time, thesacrificial layers 111 may be completely removed by the isotropicetching process. For example, if the sacrificial layers 111 are siliconnitride layers and the insulating layers 112 are silicon oxide layers,the isotropic etching process may be performed using an etching solutionincluding phosphoric acid.

The lower gate regions 145L may horizontally extend from the trench 140between the insulating layers 112 and may expose portions of thesidewall of the lower semiconductor layer 117, respectively. The uppergate regions 145U may horizontally extend from the trench 140 betweenthe insulating layers 112 and may expose portions of the sidewall of thevertical insulator 121, respectively. For example, each of the lowergate regions 145L may be defined by vertically adjacent insulatinglayers 112 and the sidewall of the lower semiconductor layer 117. Eachof the upper gate regions 145U may be defined by vertically adjacentinsulating layers 112 and the sidewall of the vertical insulator 121.Additionally, according to the embodiment illustrated in FIG. 43, thecapping layer CPL may be used as an etch stop layer during the isotropicetching process for the formation of the upper gate regions 145U. Thus,the capping layer CPL may help prevent the charge storage layer CTL frombeing damaged by the etching solution used in the isotropic etchingprocess. For example, the upper gate regions 145U may expose the cappinglayer CPL of the vertical insulator 121.

In an embodiment, a vertical height of each of the lower and upper gateregions 145L and 145U may be less the maximum width of the lowersemiconductor layer 117, as illustrated in FIG. 43. The vertical heightsof the lower and upper gate regions 145L and 145U may be substantiallyequal to the thicknesses of the sacrificial layers 111, respectively.The vertical heights of the lower and upper gate regions 145L and 145Umay be substantially equal to each other. In another embodiment, thevertical height of the lower gate region 145L may be greater than thevertical height of the upper gate region 145U.

Referring to FIGS. 29 and 44, the sidewall of the lower semiconductorlayer 117 exposed by the lower gate regions 145L may be recessed to forma lower semiconductor pattern LSP having recessed regions 146.

In an embodiment, forming the recess regions 146 at the lowersemiconductor layer 117 may include selectively etching the sidewall ofthe lower semiconductor layer 117 exposed by the lower gate regions145L. Here, the etching process for the formation of the recessed region146 may use an etch-recipe or etchant having an etch rate variedaccording to a crystal direction of a semiconductor material. Thus, therecessed region 146 may be defined by incline-surfaces 146S inclinedwith respect to the top surface of the substrate 100. The recessedregion 146 may have a tapered wedge-shape due to the incline-surfaces146S. In an embodiment, the incline-surfaces 146S defining the recessedregion 146 may be {111} crystal planes of silicon. Additionally, ahorizontal section of the lower semiconductor pattern LSP at which therecessed region 146 is formed may have a quadrilateral shape of whichsides are parallel to the <110> directions crossing each other, asillustrated in FIG. 20.

For example, the recessed region 146 may be formed by a gas phaseetching process or chemical dry etching process using an etchantincluding a halogen containing reaction gas. The halogen containingreaction gas may include at least one of HCl, Cl₂, NF₃, ClF₃, and F₂.Alternatively, the recessed region 146 may be formed by a wetanisotropic etching process using an etching solution such as an organicalkali etchant (e.g., tetramethyl ammonium hydroxide (TMAH)) or ammoniumhydroxide (NH₄OH).

When the lower semiconductor layer 117 formed of silicon is selectivelyetched, the etch rate of the lower semiconductor layer 117 may be variedaccording to a crystal plane and a crystal direction of silicon. In anembodiment, when the exposed sidewall of the lower semiconductor layer117 is etched using the halogen containing reaction gas, the etch ratein <111> directions may be greater than the etch rate in <110>directions. In this case, the etching process may be stopped at the{111} crystal planes. Thus, the {111} crystal planes of the lowersemiconductor pattern LSP may be exposed. For example, the recessedregion 146 may be defined by the {111} crystal planes and may have thetapered wedge-shape by two incline-surfaces 146S having the {111}crystal planes.

In another embodiment, when the lower semiconductor layer 117 formed ofsilicon is isotropically etched using ammonium hydroxide (NH₄OH), theetch rate of the lower semiconductor layer 117 may be the minimum at the{111} crystal planes and the etch rate of the lower semiconductor layer117 may be the maximum at {100} crystal planes. Thus, inner surfaces ofthe recessed region 146 may have the {111} crystal planes at which theeach rate is the minimum. Additionally, the recessed region 146 may havethe tapered wedge-shape by two inner surfaces of the {111} crystalplanes.

The inner surfaces of the recessed region 146 may have defects by theetching process. Thus, after the recessed region 146 is formed, acleaning process using O₃ and HF may be performed to remove the defectsof the inner surfaces of the recessed region 146.

As noted above, the lower semiconductor pattern LSP may be formed tohave the recessed region 146. Thus, the minimum width of the lowersemiconductor pattern LSP may be less than an upper width and a lowerwidth of the upper semiconductor pattern USP. In an embodiment, a depth(i.e., a lateral depth) of the recessed region 146 in a directionhorizontal to the top surface of the substrate 100 may be determineddepending on a vertical height of the lower gate region 145L and themaximum width of the lower semiconductor pattern LSP. For example, thedepth of the recessed region 146 may correspond to about a half of theheight of the lower gate region 145L. In an implementation, the minimumwidth of the lower semiconductor pattern LSP may correspond to or equala difference between the maximum width of the lower semiconductorpattern LSP and the height of the lower gate region 145L.

Referring to FIG. 45, after the lower semiconductor pattern LSP havingthe recessed region 146 is formed, the vertical heights of lower andupper gate regions 145L and 145U may be increased. For example, theinsulating layers 112 exposed by the lower and upper gate regions 145Land 145U may be isotropically etched to form enlarged lower and uppergate regions 147L and 147U. Additionally, if the vertical insulator 121includes the capping layer CPL, the charge storage layer CTL, and thetunnel insulating layer TIL, portions of the capping layer CPL may beetched to expose portions of the charge storage layer CTL in the processof forming the enlarged lower and upper gate regions 147L and 147U.Thus, capping layer patterns CP may be formed between the charge storagelayer CTL and the insulating layers 112 when the enlarged upper gateregions 147U are formed.

For example, a vertical height T2 of each of the enlarged lower andupper gate regions 147L and 147U may be greater than the vertical heightT1 of each of the lower and upper gate regions 145L and 145U in FIG. 44.Here, a difference between the vertical height T1 of each of the gateregions 145L and 145U and the vertical height T2 of each of the enlargedgate regions 147L and 147U may be about twice thickness of the cappinglayer CPL. Additionally, the enlarged lower gate region 147L may alsoexpose a portion of the sidewall of the lower semiconductor pattern LSPwhich is substantially perpendicular to the top surface of the substrate100.

In another embodiment, if the recessed region 146 of the lowersemiconductor pattern LSP is formed after the enlarged lower and uppergate regions 145L and 145U are formed, the minimum width W3 of the lowersemiconductor pattern LSP may be determined depending on the verticalheight T2 of the enlarged lower gate region 147L, such that the minimumwidth W3 of the lower semiconductor pattern LSP may be less than theminimum width W3 of the lower semiconductor pattern LSP illustrated inFIG. 18. However, in the present embodiment, the enlarged lower andupper gate regions 147L and 147U may be forming after the recessedregion 146 of the lower semiconductor pattern LSP is formed. As aresult, the minimum width W3 of the lower semiconductor pattern LSP maybe secured, and the vertical heights of the enlarged gate regions 147Land 147U may increase. For example, the minimum width W3 of the lowersemiconductor pattern LSP may be controlled independently of thevertical heights T2 of the enlarged lower and upper gate regions 147Land 147U. In an implementation, the minimum width W3 of the lowersemiconductor pattern LSP may be secured, and channel lengths of theselection and cell transistors GST, SST, and MCT in FIG. 1 may increase.

Referring to FIGS. 30 and 46, a horizontal insulating layer 151 may beformed to cover inner surfaces of the enlarged lower and the upper gateregions 147L and 147U, and lower and upper gate patterns 155L and 155Umay be formed to fill remaining spaces of the enlarged lower and uppergate regions 147L and 147U, respectively.

For example, a horizontal insulating layer 151 and a conductive layermay be sequentially formed to cover the inner surfaces of the enlargedlower and upper gate regions 147L and 147U. Then, the conductive layeroutside the enlarged lower and upper gate regions 147L and 147U may beremoved to confinedly form the lower and upper gate patterns 155L and155U in the enlarged lower and upper gate regions 147L and 147U,respectively.

The horizontal insulating layer 151 may be in direct contact with thevertical insulator 121 in the enlarged upper gate regions 147U and maybe in direct contact with the lower semiconductor pattern LSP in theenlarged lower gate regions 147U. The horizontal insulating layer 151may conformally cover the inner surface of the recessed region 146 inthe enlarged lower gate region 147.

The horizontal insulating layer 151 may include a single thin layer or aplurality of thin layers, similarly to the vertical insulating layer. Inan embodiment, the horizontal insulating layer 151 may include a firstblocking insulating layer BIL1 and a second blocking insulating layerBIL2, which are sequentially stacked. One of the first and secondblocking insulating layers BIL1 and BIL2 may be formed of a materialhaving an energy band gap less than that of the tunnel insulating layerTIL and greater than that of the charge storage layer CTL. In anembodiment, the first blocking insulating layer BIL1 may include atleast one of high-k dielectric layers such as an aluminum oxide layerand a hafnium oxide layer, and the second blocking insulating layer BIL2may include a material having a dielectric constant less than that ofthe first blocking insulating layer BIL1. In another embodiment, thesecond blocking insulating layer BIL2 may include at least one high-kdielectric layer, and the first blocking insulating layer BIL1 mayinclude a material having a dielectric constant less than that of thesecond blocking insulating layer BIL2.

In an embodiment, the conductive layer may fill the enlarged lower andupper gate regions 147L and 147U and may conformally cover an innersurface of the trench 140. In this case, the conductive layer in thetrenches 140 may be isotropically etched to form the lower and uppergate patterns 155L and 155U. In another embodiment, the conductive layermay also fill the trenches 140. In this case, the conductive layer inthe trenches 140 may be anisotropically etched to form the lower andupper gate patterns 155L and 155U. According to an embodiment, the uppergate patterns 155U may be formed in the upper gate regions 145U,respectively, and the lower gate patterns 155L may be formed in thelower gate regions 145L, respectively. Here, the lower gate patterns155L may fill the recessed regions 146 of the lower semiconductorpattern LSP. Thus, the lower gate patterns 155L may have sidewallstapered toward the lower semiconductor pattern LSP, respectively. Forexample, the lower gate pattern 155L may have sidewalls that areparallel to the incline-surfaces 146S, respectively. Thus, a horizontalwidth of the lower gate pattern 155L may be greater than a horizontalwidth of the upper gate pattern 155U. In an embodiment, forming theconductive layer may include sequentially depositing a barrier metallayer and a metal layer. For example, the barrier metal layer mayinclude a metal nitride layer such as a titanium nitride layer, atantalum nitride layer, or a tungsten nitride layer. In animplementation, the metal layer may include a metal such as tungsten,aluminum, titanium, tantalum, cobalt, or copper.

Subsequently, the dopant regions 107 may be formed in the substrate 100as described with reference to FIG. 30. Next, the electrode isolationpattern 160 may be formed on the dopant regions 107 to fill the trenches140 as illustrated in FIG. 18.

FIGS. 47 to 49 illustrate partial cross-sectional views of stages in amethod for fabricating a 3D semiconductor memory device according to anembodiment.

In the present embodiment, the vertical insulator 121 may include thecapping layer CPL, the blocking insulating layer BIL, the charge storagelayer CTL, and the tunnel insulating layer TIL, as illustrated in FIG.47. Thus, when the lower and upper gate regions 145L and 145U of FIG. 43are formed, the upper gate regions 145U may expose portions of thecapping layer CPL, respectively.

Referring to FIG. 48, the insulating layers exposed by the lower andupper gate regions 145L and 145U may be isotropically etched to formenlarged lower and upper gate regions 147L and 147U. In the presentembodiment, when the enlarged lower and upper gate regions 147L and 147Uare formed, portions of the capping layer CPL and blocking insulatinglayer BIL may be etched to expose portions of the charge storage layerCTL. Thus, the capping layer pattern CP and a blocking insulating layerpattern BIP may be formed between the charge storage layer CTL and eachof the insulating layers 112. When the capping layer CPL and theblocking insulating layer BIL are successively etched, verticalthicknesses of the insulating layers 112 may be reduced. A verticalheight T3 of each of the enlarged lower and upper gate regions 147L and147U illustrated in FIG. 48 may be greater than the vertical height T2of each of the enlarged lower and upper gate regions 147L and 147Uillustrated in FIG. 44.

Subsequently, as illustrated in FIG. 49, a vertical insulating layer 151and lower and upper gate patterns 155L and 155U may be formed in theenlarged lower and upper gate regions 147L and 147U. According to thepresent embodiment, the vertical insulating layer 151 may be in contactwith the charge storage layer CTL, and the capping layer patterns CP maybe vertically separated from each other by the upper gate patterns 155U.Additionally, the blocking insulating layer patterns BIP may beseparated from each other by the upper gate patterns 155U.

According to the embodiments of FIGS. 43 to 49, a portion of thesidewall of the lower semiconductor pattern may be etched such that thewidth of the lower semiconductor pattern becomes less than the width ofthe upper semiconductor pattern. At this time, the etch-recipe oretchant having the etch rate varied according to the crystal planes andthe crystal directions of silicon may be used. Thus, the etching processfor reducing the width of the lower semiconductor pattern may beautomatically controlled without monitoring of the width of the lowersemiconductor pattern. For example, specific crystal planes of siliconmay be used as etch stop planes when the lower semiconductor pattern isetched.

Additionally, according to embodiments, the minimum width of the lowersemiconductor pattern may be controlled independently of channel lengthsof the lower and upper gate patterns.

The 3D semiconductor memory devices in the aforementioned embodimentsmay be encapsulated using various packaging techniques. For example, the3D semiconductor memory devices according to the aforementionedembodiments may be encapsulated using any one of a package on package(POP) technique, a ball grid arrays (BGAs) technique, a chip scalepackages (CSPs) technique, a plastic leaded chip carrier (PLCC)technique, a plastic dual in-line package (PDIP) technique, a die inwaffle pack technique, a die in wafer form technique, a chip on board(COB) technique, a ceramic dual in-line package (CERDIP) technique, aplastic metric quad flat package (PMQFP) technique, a plastic quad flatpackage (PQFP) technique, a small outline package (SOIC) technique, ashrink small outline package (SSOP) technique, a thin small outlinepackage (TSOP) technique, a thin quad flat package (TQFP) technique, asystem in package (SIP) technique, a multi chip package (MCP) technique,a wafer-level fabricated package (WFP) technique and a wafer-levelprocessed stack package (WSP) technique.

The package in which the 3D semiconductor memory device according to theembodiments may be mounted may further include at least onesemiconductor device (e.g., a controller and/or a logic device) thatcontrols the 3D semiconductor memory device.

FIG. 50 illustrates a schematic block diagram of an example ofelectronic systems including 3D semiconductor memory devices accordingto an embodiment.

Referring to FIG. 50, an electronic system 1100 according to anembodiment may include a controller 1110, an input/output (I/O) unit1120, a memory device 1130, an interface unit 1140, and a data bus 1150.At least two of the controller 1110, the I/O unit 1120, the memorydevice 1130, and the interface unit 1140 may communicate with each otherthrough the data bus 1150. The data bus 1150 may correspond to a paththrough which electrical signals are transmitted.

The controller 1110 may include at least one of a microprocessor, adigital signal processor, a microcontroller, or another logic device.The other logic device may have a similar function to any one of themicroprocessor, the digital signal processor, and the microcontroller.The I/O unit 1120 may include a keypad, a keyboard, and/or a displayunit. The memory device 1130 may store data and/or commands. The memorydevice 1130 may include at least one of the 3D semiconductor memorydevices according to the embodiments described above. The memory device1130 may further include another type of semiconductor memory devices(e.g., a non-volatile memory device and/or a static random access memory(SRAM) device) that are different from the 3D semiconductor memorydevices described above. The interface unit 1140 may transmit electricaldata to a communication network or may receive electrical data from acommunication network. The interface unit 1140 may operate by wirelessor cable. For example, the interface unit 1140 may include an antennafor wireless communication or a transceiver for cable communication.Although not shown in the drawings, the electronic system 1100 mayfurther include a fast DRAM device and/or a fast SRAM device which actsas a cache memory for improving an operation of the controller 1110.

The electronic system 1100 may be applied to a personal digitalassistant (PDA), a portable computer, a web tablet, a wireless phone, amobile phone, a digital music player, a memory card, or other electronicproducts. The other electronic products may receive or transmitinformation data by wireless.

FIG. 51 illustrates a schematic block diagram of an example of memorycards including 3D semiconductor memory devices according to anembodiment.

Referring to FIG. 51, a memory card 1200 according to an embodiment mayinclude a memory device 1210. The memory device 1210 may include atleast one of the 3D semiconductor memory devices according to theembodiments mentioned above. In other embodiments, the memory device1210 may further include another type of semiconductor memory devices(e.g., a non-volatile memory device and/or a static random access memory(SRAM) device) which are different from the 3D semiconductor memorydevices according to the embodiments described above. The memory card1200 may include a memory controller 1220 that controls datacommunication between a host and the memory device 1210.

The memory controller 1220 may include a central processing unit (CPU)1222 that controls overall operations of the memory card 1200. Inaddition, the memory controller 1220 may include an SRAM device 1221used as an operation memory of the CPU 1222. Moreover, the memorycontroller 1220 may further include a host interface unit 1223 and amemory interface unit 1225. The host interface unit 1223 may beconfigured to include a data communication protocol between the memorycard 1200 and the host. The memory interface unit 1225 may connect thememory controller 1220 to the memory device 1210. The memory controller1220 may further include an error check and correction (ECC) block 1224.The ECC block 1224 may detect and correct errors of data which are readout from the memory device 1210. Even though not shown in the drawings,the memory card 1200 may further include a read only memory (ROM) devicethat stores code data to interface with the host. The memory card 1200may be used as a portable data storage card. Alternatively, the memorycard 1200 may realized as solid state disks (SSD) which are used as harddisks of computer systems.

FIG. 52 illustrates a schematic block diagram of an example ofinformation processing systems including 3D semiconductor memory devicesaccording to an embodiment.

Referring to FIG. 52, a flash memory system 1310 may be installed in aninformation process system 1300 such as a mobile device or a desk topcomputer. The flash memory system 1310 may include at least one of the3D semiconductor memory devices according to the aforementionedembodiments. The information processing system 1300 according to anembodiment may include a modem 1320, a central processing unit (CPU)1330, a RAM 1340, and a user interface unit 1350 that are electricallyconnected to the flash memory system 1310 through a system bus 1360. Theflash memory system 1300 may be constructed to be identical to theaforementioned memory card. The flash memory system 1310 may store dataprocessed by the CPU 1330 or data inputted from an external device. Theflash memory system 1310 may include a solid state disk (SSD). In thiscase, the information processing system 1310 can stably store large datain the flash memory system 1310. As the reliability of the flash memorysystem 1310 becomes improved, the flash memory system 1310 can reduceresources used to correct errors, thereby providing a high speed dataexchange function to the information processing system 1300. Even thoughnot depicted in the drawings, the information processing unit 1300according to some embodiments may further include an applicationchipset, a camera image processor (CIS) and/or an input/output device.

According to embodiments, the epitaxial pattern (or the lowersemiconductor pattern) between the substrate and the vertical structure(or the upper semiconductor pattern) may have the recessed sidewall (orthe recessed region). Thus, the lowermost horizontal structure adjacentto the epitaxial pattern may have the convex portion toward the recessedsidewall, and the minimum width of the epitaxial pattern is less thanthe width of the vertical structure. As a result, the process margin ofthe process for forming the horizontal structure may be secured torealize the 3D semiconductor memory device having high reliability.

By way of summation and review, three-dimensional (3D) semiconductormemory devices may be used to increase integration density. Productionof 3D semiconductor memory devices may be expensive when compared with2D semiconductor memory devices and may have concerns regardingproviding reliable product characteristics.

The embodiments provide three-dimensional semiconductor memory deviceswith high integration density and improved reliability.

The embodiments also provide methods for fabricating a three-dimensionalsemiconductor memory device capable of improving integration density andreliability.

Example embodiments have been disclosed herein, and although specificterms are employed, they are used and are to be interpreted in a genericand descriptive sense only and not for purpose of limitation. In someinstances, as would be apparent to one of ordinary skill in the art asof the filing of the present application, features, characteristics,and/or elements described in connection with a particular embodiment maybe used singly or in combination with features, characteristics, and/orelements described in connection with other embodiments unless otherwisespecifically indicated. Accordingly, it will be understood by those ofskill in the art that various changes in form and details may be madewithout departing from the spirit and scope of the present invention asset forth in the following claims.

1.-44. (canceled)
 45. A three-dimensional (3D) semiconductor memorydevice, comprising: a lower structure including a lower gate pattern anda lower semiconductor pattern penetrating the lower gate pattern, thelower semiconductor pattern being connected to a substrate; and an upperstructure including upper gate patterns stacked on the lower structure,an upper semiconductor pattern penetrating the upper gate patterns, anda vertical insulator between the upper semiconductor pattern and theupper gate patterns, the upper semiconductor pattern being connected tothe lower semiconductor pattern, wherein the lower semiconductor patternhas a rounded sidewall adjacent to the lower gate pattern, and whereinthe lower semiconductor pattern includes an epitaxial pattern.
 46. The3D semiconductor memory device as claimed in claim 45, wherein a minimumwidth of the lower semiconductor pattern is less than a lower width ofthe upper semiconductor pattern.
 47. The 3D semiconductor memory deviceas claimed in claim 45, wherein the vertical insulator includes a datastorage layer.
 48. The 3D semiconductor memory device as claimed inclaim 45, wherein the lower semiconductor pattern has a differentcrystalline structure from the upper semiconductor pattern.
 49. The 3Dsemiconductor memory device as claimed in claim 45, wherein the lowergate pattern is spaced apart from the rounded sidewall of the lowersemiconductor pattern by a first distance, and the upper gate pattern isspaced apart from a sidewall of the upper semiconductor pattern by asecond distance greater than the first distance.
 50. The 3Dsemiconductor memory device as claimed in claim 45, further comprising ahorizontal insulator between the lower gate pattern and the lowersemiconductor pattern and between the vertical insulator and each of theupper gate patterns, wherein: the horizontal insulator between the lowergate pattern and the lower semiconductor pattern extends onto a topsurface and a bottom surface of the lower gate pattern; and thehorizontal insulator between the vertical insulator and each of theupper gate patterns extends onto a top surface and a bottom surface ofeach of the upper gate patterns.
 51. The 3D semiconductor memory deviceas claimed in claim 45, wherein a maximum width of the lowersemiconductor pattern is greater than a maximum width of the uppersemiconductor pattern.
 52. A three-dimensional (3D) semiconductor memorydevice, comprising: a stack structure including insulating layersvertically stacked on a substrate and a lower gate pattern between theinsulating layers; a lower semiconductor pattern penetrating the lowergate pattern and being connected to the substrate, the lowersemiconductor pattern including first portions adjacent to theinsulating layers and a second portion adjacent to the lower gatepattern; an upper gate pattern stacked on the insulating layers; and asemiconductor pillar disposed through the upper gate pattern in adirection substantially vertical with respect to the substrate, whereinthe second portion of the lower semiconductor pattern has a roundedsidewall, and the lower semiconductor pattern includes an epitaxialpattern, and wherein the rounded sidewall has a first degree ofcurvature and a sidewall of the semiconductor pillar adjacent to theupper gate pattern has a second degree of curvature, and the firstdegree is greater than the second degree.
 53. The 3D semiconductormemory device as claimed in claim 52, wherein the second portion of thelower semiconductor pattern has a width less than that of the firstportion of the lower semiconductor pattern.
 54. The 3D semiconductormemory device as claimed in claim 52, further comprising a horizontalinsulator between the lower gate pattern and the lower semiconductorpattern, the horizontal insulator extending onto a top surface and abottom surface of the lower gate pattern.
 55. A method for fabricating athree-dimensional (3D) semiconductor memory device, the methodcomprising: forming a multi-layered structure including sacrificiallayers and insulating layers alternately and repeatedly stacked on asubstrate; forming an opening penetrating the multi-layered structuresuch that the opening exposes the substrate; forming a lowersemiconductor layer filling a lower region of the opening; forming avertical insulator and an upper semiconductor pattern in the openinghaving the lower semiconductor layer; patterning the multi-layeredstructure to form trenches exposing the substrate such that the trenchesare spaced apart from the opening; removing the sacrificial layersexposed by the trenches to form gate regions; selectively etching thelower semiconductor layer exposed by at least a lowermost one of thegate regions to form a lower semiconductor pattern having a recessedregion defined by incline-surfaces inclined with respect to a topsurface of the substrate; and forming gate patterns in the gate regions,respectively.